-
Solving Ultraviolet Curable Potting & Encapsulating Problems With Shadow Cure Technology
dissipation, flame retardency, or vibration resistance. Epoxies, Etc... located in Cranston, RI USA, has designed new Ultraviolet (UV) Curing materials that offer many advantages over two component systems. These products are also different than most common UV. Potting or encapsulation
-
MICRO: Product News
defect review and inspection system for 200-mm wafers combines extremely high resolution with full automation. With deep ultraviolet air-space-technology optics, the tool can generate images in various modes, including bright-field, dark-field, differential interference contrast, confocal, ultraviolet
-
MICRO: Product News
transfer. An integrated minienvironment is a standard feature on the 3100 and 3200 and optional on the 3000. The systems allow bright-field and dark-field observation, and optional differential interference contrast observation. A deep-ultraviolet module is available to meet 0.10-um design rules
-
MICRO: Products
. Energetiq Technology. Woburn, MA. The EQ-10M electrodeless Z-Pinch extreme ultraviolet (EUV) light source enables researchers to develop the infrastructure needed to support EUV lithography. The stable and controllable system creates light from a xenon gas plasma. It works by inductively coupling the power
-
MICRO: Products
conventional traps, it forces all effluents to go through every filtration stage. (Semicon Europa, Booth A3.562). Surface-Inspection Camera. Sony Electronics. Park Ridge, NJ. The XCD-SX900UV high-resolution, black-and-white digital CCD video camera with near-ultraviolet sensitivity captures clear images
-
MICRO: Products
technology is used for high-resolution imaging through silicon, GaAs, and other materials that can transmit at these wavelengths. In addition, a deep-ultraviolet (DUV) inspection module extends the 0.30-um inspection limit to the ~0.08 um range. The DUV light module is easily retrofitable
-
MICRO: Products
). Photoelectron Spectroscopy. RKI Instruments. Union City, CA. The Model AC-2 photoelectron spectrometer, designed for atmospheric-pressure operation, consists of an open counter equipped with an ultraviolet source. The instrument, which measures ionization potential and the work function of surfaces
-
MICRO: Products
of new defect classes, so that customers can define defects based on their existing classification systems. EUVL Simulation Software. Sigma-C. Munich, Germany. Simulating extreme-ultraviolet lithography (EUVL), Solid-EUV facilitates EUV imaging R&D by allowing users to characterize specifications