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MICRO: Product Technology News (May '2000)
by applying airflow and temperature control within the machine chamber and through the use of a hybrid active damper. The tool's improved vibration isolation structure allows synchronization control at a high scanning speed. A series of in-process monitors detects and measures ESD events accurately
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MICRO:Archive:Back Issue TOC
control mat, particle size and shape analyzer, filtration system, ESD display tower, process analyzers, chemical filtration material. Product Extra!. April 2001. Selected Contents. EDITOR S PAGE. Disruptive technologies. INDUSTRY NEWS. Lead Story: Intel sees light, unveils chip industry's first EUV
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MICRO: Archive: Back Issue TOC
, integrated metrology tool, cleanroom-compatible filters, liquid optical particle counter, storage system/stocker, extractive gas monitor, ESD monitoring system, machine control system, mechanical vacuum pump, field emission SEMs, continuous gas-emission monitor Vendor releases new version of wafer-mapping
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MICRO:Archives of 1998 Issues
MEMS contamination questions starting to yield some answers Firesafe plastics for fab environments scrutinized; Lucent, Emcore team to develop new thin films; CMP wastewater reclaim system debuts; Balazs Lab installs Atomika metrology tools; ESD standards published Applied buys Consilium in stock
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MICRO: Tool/Fab Automation
electrostatic discharge (ESD) events. Such discharges can cause microprocessors in process tools to operate unpredictably. Erratic tool behavior, in turn, can result in tool lockups, failed calibrations, and error messages, all of which lead to tool downtime and the need for operator intervention
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MICRO:Product Technology News (June '99)
active RF and wafer-area pressure control. (Semicon West, San Francisco, South Hall, Booth 1632) The 8100XP-R CD scanning electron microscope addresses the metrology requirements of low-k1 lithography and 0.18-um technologies. It can measure both reticles and wafers without any hardware or software
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Product Technology News
full production later. Cluster software provides fully integrated control of each tool through a master control station, as well as the ability to control the complete cluster through a host computer. Options include in situ end-point detection and a bar-code reader. (Semicon West, San Francisco
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MICRO:July/August 98:Product Technology News
, 973/455-5000. Carl Zeiss, UV Axiotron 2 for semiconductor defect inspection brochure. Information: +49 36 41 64 2563 or 800/233-2343; fax, +49 36 41 64 2938. CEA Instruments, toxic and combustible gas monitors product guide. Information: 201/967-5660; fax, 201/967-8450. Desco, ESD control products