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  • AIMS EUV: the actinic aerial image review platform for EUV masks
    Such measurements can be achieved via imaging the EUV -plasma onto a calibrated CCD detector, e.g. via a pin- hole or imaging system. In our measurement program with source suppliers we experienced the strong dependence of the reported brightness values …
  • Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography
    … jet stability was analyzed using a long distance microscope (Questar, QM100) in combination with a CCD camera. Laser requirements are high for LPP EUV light sources with more than 1 0kW average power necessary related to the demand from exposure equipment suppliers .
  • Design and Evaluation of System Configurations for an EUV Mask Inspection Microscope
    Furthermore the penetration depth of EUV into the scintillator is approximately 20nm, thus all of the fluorescence … … visible light microscope should be sufficient to enlarge the scintilator image onto the CCD over an acceptable … Choice of supplier and specific objectives and magnifications is up to the vendor.
  • Performance of the full field EUV systems
    … only light around the 13.5 nm wavelength and a visible-light-sensitive CCD camera placed behind … Because the camera is calibrated to an in-band EUV standard at the supplier , a value for the in-band power at intermediate focus can be derived from the camera image.
  • Top Level User Specifications for Mask Inspection Microscope
    Ideally, an EUV tool should be data rate rather than source limited; a high-resolution scientific grade CCD takes a few seconds to download an entire image, so individual frame exposure times of less than a second should be aimed for. The cleanliness requirement is an issue to be determined between the supplier and customer.
  • EUV Sources for Lithography
    Figure 27.3 Summary of FC and supplier data on EUV source performance development. This can be used to image the EUV source onto a CCD camera at magnifications between 2 …
  • EUV light source and laser considerations for scalability and high-energy conversion efficiency
    One of most important issues facing source suppliers is how to increase the mean time to failure for the EUV optics. … channel plate (MCP) with a phosphorous screen that is imaged on to a CCD camera, as shown …
  • ORA's Expansion Continues with Tucson Office Growth
    … at Raytheon Missile Systems in Tucson, providing support for equipment required to test CCD -based optical seekers. … Senior Systems Engineer in Optical Design, and is focusing on the design of advanced EUV lithographic systems. ORA is an innovative solutions supplier to the optics and optical telecommunications industries.
  • Photomask registration and overlay metrology by means of 193 nm optics
    … Working distance [mm] vs. NA for commercially available micro objectives of different major suppliers (visible wavelengths and … While different types of masks (COG, MoSi, EUV ), as well as the dimension and shape of the … … low contrast image in combination with the inherent noise of the imaging system ( CCD camera & electronics …
  • Studies in optimal configuration of the LTP
    Continental Optical was the general contractor, and optical component supplier . Advances in Metrology for X-Ray and EUV Optics III, edited by Lahsen Assoufid, Peter Z. Takacs … The discrete nature of the CCD camera appears in errors of fitting a parabola to the classical …