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  • MICRO: EUV litho
    Intel ramps up EUV litho development, installs 300-mm microexposure system, sets up Extreme-ultraviolet (EUV) lithography has entered the development phase at Intel. The company said in early August that it had installed the first commercial microexposure tool (MET) at its RP1 fab in Hillsboro
  • MICRO: 'Round the Circuit
    International Sematech has signed a five-year agreement with the State University of New York (SUNY) at Albany intended to speed the development of next-generation lithography. The consortium and the university will collaborate in a program to develop the infrastructure for EUV lithography
  • MICRO: World Beat
    The Swedish manufacturer of an EUV light source has set its sites on selling the system to major stepper manufacturers for use in next-generation lithography tools. Stockholm-based Innolite says ASML, Canon, and Nikon have shown keen interest in the company's plasma light source. The source
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    of extreme-ultraviolet (EUV) lithography are looking north, specifically to the University at Albany, State University of New York, for their future. Mask tool market needs to consolidate, says Sematech There are too many fab-tool vendors chasing after too few dollars in the photomask business
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    in 2004. TRW claims first laser source for production EUV tools ST. CHARLES, Mo. -- TRW Inc.'s Cutting Edge Optronics (CEO) subsidiary here claims it has developed the world's first laser source prototype that could enable a production-worthy lithography tool, based on extreme ultraviolet (EUV
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    plans to pare back its electrochemical mechanical deposition (ECD) and wafer handling units. Sematech opens EUV resist center Chip-making consortium International Sematech announced the opening of an R &D center that will explore and develop next-generation photoresists for extreme ultraviolet (EUV
  • Semicon West --Business is back
    Uncertainty and Complexity, Forecasting Techniques for the SEM Industry, Nano The Next Technology, Materials, Processes, Lead-Free Soldering, Advanced Packaging Technology Solutions, Pushing the Limits: Optical Enhancements, Polarization and Immersion, Semiconductor Processing Technology, EUV
  • MICRO: Industry News: Lead Story (April 2001)
    Hailing the development as a giant step for next-generation lithography, Intel boasts it has delivered the world's first EUV photomask. The giant chipmaker claims the breakthrough will enable the industry to continue Moore's Law scaling on silicon wafers through 2010. Beta tools incorporating

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