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  • Polishing Mechanism of Glass Substrates with its Processing Characteristics by Cerium Oxide and Manganese Oxide Slurries
    With an aim to reduce the consumption of cerium oxide (CeO2) used in large quantity for the polishing of glass substrates applied for HDD and display, we have attempted to obtain the processing characteristics of glass substrates by CeO2 slurry .
  • Advanced Tribology
    ...due to the agglomeration of nano-particles and many adhesion particles on the HDD substrate surface after... ...19 are immobilized on spheral silica particles and act as flexible molecular brush in chemical mechanical polishing . ...22 shows Ni-P surfaces of hard discs roughly polished by using a slurry with Al2O3 particles...
  • Physics and tribology of chemical mechanical planarization
    Manipulation of the CMP slurry formulation allows different levels of PTR: a zero PTR slider in figure... Transducer damage can result in a serious malfunction of a HDD system. . Relative speeds of a wafer against a polishing pad under specific rotation speeds of a carrier and...
  • Applications of a laser assisted defect detection system for chemical mechanical planarization (CMP) slurry development in rigid disk polishing
    The disk samples were polished with a chemical mechanical planarization (CMP) technique beforehand. Since it has been recognized that the CMP slurry formulation highly affects the scratch performance of rigid... ...Candela, dark field microscope, chemical mechanical planarization (CMP), defects, scratches, correlation, rigid disk, hard disk drive ( HDD ) .
  • Digest of the Asia-Pacific Magnetic Recording Conference 2002 (Cat. No.02EX584)
    Polishing Slurry for NI-P Plated Substrates Suitable for Over 80Gbiffin’ Recording Density Effect of Lubricant Bonding on Nanotribological Properties on HDD DaqingXu, E. Liu andB.
  • Parametric optimization of ultrasonic machining of co-based super alloy using the Taguchi multi-objective approach
    Abrasive slurry Tam SC, Loh NH, Miyazawa S (1989) Optimization of the ECM- abrasive polishing of mild steel using... ...YH, Haung ML, Chang CH (2006) Optimizing the con- troller IC for micro HDD process based on...
  • Design and Manufacturing of Active Microsystems
    To accomplish both, the slider pad areas are machined by nanogrinding [13], followed by Chemical-mechanical Pol- ishing (CMP) [15]. In all experiments, a slurry flow rate of The latter one’s dimensions agree with a Hard Disk Drive ( HDD ) “pico�?slider.
  • Nanometer CMOS ICs
    ...261, 262 charge-pump, 194 charged-device model, 576 CHEI, 336 Chemical Mechanical Polishing , 147 Chemical Vapour... ...accelerator, 392 rv description language, 369, 383 hardware/ software codesign, 389 HCE , 563 HDD , 166 HDGA, 416... ...six-transistor SRAM cell, 300 slack borrowing, 522 sleep mode, 497 SLI, 420 slurry , 148 SMD, 639...
  • Advanced Ceramic Technologies & Products
    The following devices incorporate magnetic heads made of ferrite: HDD magnetic head• Spherical lenses have been produced for a long time by polishing optical glass. In this process, an organic binder is also added to the slurry , which is then spray dried...
  • Modern Electroplating 5th Edition
    In particular, HDDs with increased recording density are installed as external storage devices in highly functional electrical... ...and the operation corresponds well with other bulk treatment operations such as barrel polishing , burnishing, deburring, phosphating... ...color is observed, the disc is dimpled again using a 10-mm diamond slurry and is checked...

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Saint-Gobain Innovative Materials
Saint-Gobain Innovative Materials
Competition Chemicals, Inc.
Competition Chemicals, Inc.
Lapmaster International