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MICRO: Expansions and Acquisitions
of Watertown, MA, has purchased the wastewater treatment business from Microbar. Microbar's EnChem technology removes dissolved and suspended contaminants from semiconductor process waste streams. The process can treat silica and alumina CMP, copper CMP, fluoride, arsenic, and other heavy metals. Based...
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The effects of wood
metal ions that react with wood resin will help reduce deposition problems in system closure. A patented commercial system has been developed that can remove both extractives and heavy metals from process waters82. The process, Kemira Netfloc, consists of a flotation unit that employs polyethylene...
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Duquesne University's Jim Drennan on PAT Calibration and Innovation
columns. I was struck with the idea that we re not measuring enough of the physical parameters. We re only interested in whether something is clean and whether it s the right chemical, and we do some compendial tests and is it heavy metals that. Pharmaceutical Process Analytical Technology | Duquesne's...
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MICRO:Building Copperopolis (Jan '99)
wands, and immersion baths are the current equipment options for post-CMP wafer cleaning. These systems are heavy consumers of water a double-brush scrubber can use more than 200 gal/day in idle mode to maintain the brushes, and its consumption can increase tenfold during actual scrubbing at a time...
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MICRO:Surface Chemistries, by Joseph Zahka, p.85 (March '99)
. This article describes the application of organic photoresist strippers to remove bulk resist and heavy postetch residues in a current wafer processing scheme. The physical properties for specific formulations, such as viscosity and surface tension, are listed and the effect they have on filter choice...
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MICRO:June 98:Semicon West Exhibitors - page 2
. Borkman, Praxair Are We Extracting All the Trace Metals? J. R. Witcofsky and S. N. Ketkar, Air Products & Chemicals Lunch with Poster Session (presenting companies: Texas Instruments, CFM Technologies, Rippey, Anatech, SAES Getters, Ulvac, Allvac, Asyst Technologies, Sumitomo Heavy Industries...
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MICRO:Product Technology News (March 2001)
, making it more cost-effective and efficient than traditional valve manifolds made of heavy metal or plastic. Tolerance problems and potential leak points are minimized by an elastomer base for screwless assembly and fewer functional parts. Compact Process Controller. Watlow Electric Manufacturing. St...
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Manufacturing & Test Standards for SPD's
occupancies, Heavy-duty stacks, Watercraft,. Structures containing flammable vapors, flammable gases, or liquids that give off flammable. vapors. This document does not cover lightning protection system installation requirements for. early streamer emission systems or charge dissipation systems. NEMA...
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Mitigation of Fretting Fatigue Damage in Blade and Disk Pressure Faces with Low Plasticity Burnishing (.pdf)
are attributed to the. relatively shallow depth of compression, typically 0.005 in. (0.125 mm) deep, and the heavy cold work associated with the. shot peened surface. Several independent studies have now. shown that the deeper compressive residual stresses from LPB. FIGURE 2 - A close-up view...
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MICRO:Product Technology News (July '99)
applications include polymer removal, diluted-HF etching, highly selective oxide removal, and nonselective oxide nitride removal. The processor demonstrates +-1% uniformity, high selectivity, particle contamination levels of <30 particles measuring >0.16 um, and heavy metal/ion contaminant levels...