Supplier: Morgan Advanced Materials
Description: A Magnesia partially-stabilised Zirconia with exceptional transformation toughening properties. Contains 96.5% ZrO2 and HfO2 in combination with 3.5% MgO. Designed for applications requiring maximum strength.
- Specialty Ceramic Type: Magnesia / Magnesite, Zirconia
Supplier: Morgan Advanced Materials
Description: Alumina-based material with mechanical properties enhanced by the addition of yttria partially-stabilised zirconia. Typically contains in excess of 80% Al2O3 with the remainder comprising mainly ZrO2 and HfO2 in combination, plus a small percentage of Y2O3.
- Specialty Ceramic Type: Yttria, Zirconia
- Aluminum Oxide / Aluminate Type: Alumina / Aluminum Oxide
Supplier: Umicore Materials
Description: Special Materials for Precision Optics & Laser Coatings High refractive index films for AR and multilayer coatings Low-absorbing, hard, adherent and abrasion-resistant films High laser damage threshold Thin films made from HfO2 or HfO2X source material have a refractive index in the range
- Type: Evaporation Material
- Materials Processed: Oxides, Specialty / Other
- Applications: Optical Coatings
- Applications & Features: Anti-reflective, Transparent, Wear Resistant
Supplier: GFS Chemicals, Inc.
Description: ITEM#:A3438 HfO2 CAS#:12055-23-1 F.W.:210.49 NFPA#: Specific Gravity: 0.000 DOT:NR Descriptions: May contain up to 1% Zirconium. Specification TEST 1. Assay (Hf+Zr metals basis) 99.9% 2. Zirconium 1% Properties No properties.
- Material Type: Hafnia / Hafnium Oxide
- Type: Powder / Aggregate (Grain / Grog)
Supplier: Materion Corporation
Description: Aluminum Oxide, Al2O3 Antimony Oxide, Sb2O3 Barium Oxide, BaO Barium Titanate, BaTiO3 Bismuth Oxide, Bi2O3 Bismuth Titanate, Bi4Ti3O12 Ba Sr Titanate, BST Chromium Oxide, Cr2O3 Copper Oxide, CuO Hafnium Oxide, HfO2 Indium Oxide, In2O3 Indium Tin Oxide, ITO Lanthanum Aluminate, LaAlO3
- Type: CVD / Chemical Precursor
- Materials Processed: Oxides
Find Suppliers by Category Top
Engineering Web Search: HfO2 Top
Articles by keyword: «HfO2» 18 papers on 2 pages: 1[2 [next
HF Based Solutions for HfO2 Removal; Effect of pH and...
HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity, p.97
Microstructure and Conductivity Study of HfO2 Membrane in...
of 2-8nm-thick HfO2 layer using ALD followed by anneal Ge selective wet etch out of HfO2 at 800oC for 3hrs in Ar nanotubes HfO2 Precursor (Temp.)
JOURNAL OF APPLIED PHYSICS VOLUME 94, NUMBER 2 15 JULY 2003...
in vacuum to 900?1050 ?C. Film decomposition is a strong function of the HfO2 overlayer thickness at a given temperature, but the underlying SiO2
Chemical vapor deposition of HfO2 films on Si,,100... S. Sayan...
Chemical vapor deposition of HfO2 films on Si,,100... S. Sayan Department of Chemistry, Rutgers University, Piscataway, New Jersey 08854 S.
Structural and electrical properties of HfO2 films grown by...
Structural and electrical properties of HfO2 films grown by atomic layer deposition on Si and Ge S. Spiga*, M. Fanciulli, C. Wiemer, G. Scarel, G.
Physical and electrical characteristics of Hf02/Hf films...
The HfO2 thin film was deposited on p-type (100) silicon wafers by atomic layer deposition (ALD) using TEMAH and 03 as precursors, Prior to the
A Comparative Study of NBTI and PBTI (Charge Trapping) in...
A Comparative Study of NBTI and PBTI (Charge Trapping) in SiO2/HfO2 Stacks with FUSI, TiN, Re Gates
PHYSICAL REVIEW B 75, 104112 2007 First-principles study of...
interstitials in both HfO2 and ZrO2, and identified that oxy- gen vacancies are the main electron traps in both Hafnia HfO2 and zirconia ZrO2 are
NIST Property Data Summaries for Elastic Moduli Data for...
HfO2 · xEr2O3(cubic) hafnium dioxide (cubic), erbia stabilized cubic hafnia, Er-HfO2(c), HfO2(cubic,Er)