Supplier: Morgan Advanced Materials
Description: A Magnesia partially-stabilised Zirconia with exceptional transformation toughening properties. Contains 96.5% ZrO2 and HfO2 in combination with 3.5% MgO. Designed for applications requiring maximum strength.
- Specialty Ceramic Type: Magnesia / Magnesite, Zirconia
Supplier: GFS Chemicals, Inc.
Description: ITEM#:A3438 HfO2 CAS#:12055-23-1 F.W.:210.49 NFPA#: Specific Gravity: 0.000 DOT:NR Descriptions: May contain up to 1% Zirconium. Specification TEST 1. Assay (Hf+Zr metals basis) 99.9% 2. Zirconium 1% Properties No properties.
- Material Type: Hafnia / Hafnium Oxide
- Type: Powder / Aggregate (Grain / Grog)
Thin Film Materials - Nonferrous Metals and Alloys,Refractory and Reactive Metals,Tungsten and Tungsten Alloys,Molybdenum and Molybdenum Alloys -- Evaporation BoatsSupplier: PLANSEE SE
Description: PLANSEE supplies tungsten and molybdenum boats and liners to collect the material as it evaporates. Our materials and their alloys have a good electrical conductivity, low vapor pressures and very high melting points. We deliver customized sizes and geometries for your process.
Supplier: Umicore Materials
Description: Umicore Thin Film Products, the best in class for optical coating materials, offer a complete range of high performance evaporation materials, sputtering targets and accessories for the Optics market. Umicore Thin Film Products (TFP) well-equipped analytical lab allows a variety of measurements
- Type: Evaporation Material
- Bulk Solid (Powder, Granule, Lumps, etc.): Yes
- Materials Processed: Specialty / Other
- Applications: Optical Coatings
Supplier: Superior Technical Ceramics Corp.
Description: For our stock lengths of 24". Ceramic tubes and rods can be cut to shorter lengths. A dash number with the length is added to the above numbers to represent a cut length. (Ex. 960300-12 represents a 3/16" diameter x 12" long rod.)
- Material Type: Alumina / Aluminum Oxide
- Shape / Form: Rod Stock
- Applications: Dielectric / Electrical Insulation
- Material Form: Ceramic / Inorganic, Rod Stock
Supplier: Aremco Products, Inc.
Description: Fine grain aluminum nitride castable with high thermal conductivity
- Applications: Refractory / High Temperature Materials
- Material Type: Specialty Ceramic
Supplier: Insaco, Inc.
Description: Custom strontium titanate parts machined to your specifications
- Material Form: Ceramic / Inorganic, Fabricated Part / Shaped Stock, Film / Sheet, Hollow / Tubular Stock, Plate / Board (e.g., Fiberboard), Wafer / Substrate
- Features: Electronics / Semiconductors, Electrical Power / HV
- Material Type: Specialty Ceramics
- Shape / Form: Fabricated / Custom Shape, Tube Stock
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Engineering Web Search: HfO2 Top
Articles by keyword: «HfO2» 18 papers on 2 pages: 1[2 [next
HF Based Solutions for HfO2 Removal; Effect of pH and...
HF Based Solutions for HfO2 Removal; Effect of pH and Temperature on HfO2: SiO2 Etch Selectivity, p.97
Microstructure and Conductivity Study of HfO2 Membrane in...
of 2-8nm-thick HfO2 layer using ALD followed by anneal Ge selective wet etch out of HfO2 at 800oC for 3hrs in Ar nanotubes HfO2 Precursor (Temp.)
JOURNAL OF APPLIED PHYSICS VOLUME 94, NUMBER 2 15 JULY 2003...
in vacuum to 900?1050 ?C. Film decomposition is a strong function of the HfO2 overlayer thickness at a given temperature, but the underlying SiO2
Chemical vapor deposition of HfO2 films on Si,,100... S. Sayan...
Chemical vapor deposition of HfO2 films on Si,,100... S. Sayan Department of Chemistry, Rutgers University, Piscataway, New Jersey 08854 S.
Structural and electrical properties of HfO2 films grown by...
Structural and electrical properties of HfO2 films grown by atomic layer deposition on Si and Ge S. Spiga*, M. Fanciulli, C. Wiemer, G. Scarel, G.
Physical and electrical characteristics of Hf02/Hf films...
The HfO2 thin film was deposited on p-type (100) silicon wafers by atomic layer deposition (ALD) using TEMAH and 03 as precursors, Prior to the
A Comparative Study of NBTI and PBTI (Charge Trapping) in...
A Comparative Study of NBTI and PBTI (Charge Trapping) in SiO2/HfO2 Stacks with FUSI, TiN, Re Gates
PHYSICAL REVIEW B 75, 104112 2007 First-principles study of...
interstitials in both HfO2 and ZrO2, and identified that oxy- gen vacancies are the main electron traps in both Hafnia HfO2 and zirconia ZrO2 are
NIST Property Data Summaries for Elastic Moduli Data for...
HfO2 · xEr2O3(cubic) hafnium dioxide (cubic), erbia stabilized cubic hafnia, Er-HfO2(c), HfO2(cubic,Er)