|
|
|
|
Welcome to GlobalSpec - a trusted source for engineers and industrial professionals.
Search GlobalSpec to find
Search GlobalSpec to find
HfO2 Precursor
-related products, suppliers, datasheets and CAD.|
Product Announcements
|
Saint-Gobain NorPro 
Saint-Gobain Coating Solutions 
TPL, Inc. 
Saint-Gobain Innovative Materials
Hitachi Metals America, Ltd.
TPL, Inc. |
Products/Services for HfO2 Precursor
-
Ceramic Powders and Precursors - (197 companies)Ceramic powders and precursors contain oxides, carbides, nitrides, carbon, and other non-metals. They are usually micron or mesh-size in distribution. Ceramic powders, sol-gel solutions and precursors are fabricated through atomization, crushing, milling, precipitation, and other chemical processes. Search by Specification | Learn More -
Thin Film Materials - (181 companies)Thin film materials are high purity materials and chemicals such as precursor gases, sputtering targets, or evaporation filaments used to form or modify thin film deposits and substrates. How to Select Thin Film Materials. What Are Thin Film... Search by Specification | Learn More -
No Image AvailableGlass Powders and Precursors - (12 companies)Glass powders and glass precursors typically consist of oxides with a random, liquid-like or non-crystalline molecular structure. Glass powders and glass precursors are used in a wide variety of applications, so they come in a range of particle sizes and particle distributions. Search by Specification | Learn More
-
Nanomaterials - (266 companies)...is a process in which chemicals react to produce very pure, high-performance films. CVD involves flowing a precursor gas or gasses into a chamber containing one or more heated objects to be coated. A chemical reaction occurs on or near the heated surfaces... Search by Specification | Learn More -
Thin Film Equipment - (309 companies)...physical vapor deposition (PVD), ion implantation, plasma etching or cleaning, rapid thermal processing (RTP), and vacuum annealing. In chemical vapor deposition (CVD) processes, a precursor gas or mixture of gases is fed into a chamber... Search by Specification | Learn More -
Thin Film Sources - (81 companies)Thin film sources consist of magnetrons, evaporation thermal units, ion beams and other sources that produce deposition materials (vapors or ions) in a thin film system. Learn More
-
Electronic and Semiconductor Gases - (35 companies)Electronic and semiconductor gases are specialized for microelectronic manufacturing or semiconductor processing applications such as thin film deposition (CVD, PVD), etching, RTP, packaging or soldering. Learn More
-
Materials Processing Services - (322 companies)Materials processing services mechanically or thermally process metals, thermal ceramics, polymers, glasses and other materials on a contract basis. Search by Specification | Learn More
-
Oxide Ceramics - (192 companies)Oxide ceramics include alumina, zirconia, silica, aluminum silicate, magnesia and other metal oxide based materials. Search by Specification | Learn More
-
Gas Generation Equipment - (309 companies)Gas generation equipment provides an onsite supply of gas, vapor, or humidity (water vapor). It eliminates the need for delivery in gas cylinders, which can be bulky and may have special storage requirements. Search by Specification | Learn More
Product News for HfO2 Precursor
-
Real Tech, Inc.
Disinfection By-Products - Precursor MonitoringDisinfection By-Products (DBP) Precursor Monitoring. Chlorine has long been used as a primary disinfection method for many water and wastewater treatment applications. However, there is growing concern about the harmful DBP's produced by the use of chlorine. DBP's, such as triahalomethanes (THMs), can occur when the natural organic matter (NOM) that is present in the water is combined with chlorine. More specifically, the portion of NOM in the water that is aromatic is the most reactive... (read more)Browse Water Quality Testing Instruments Datasheets for Real Tech, Inc. -
Metalfab, Inc.
Pre-Steamer Bin ActivatorMetalfab's rugged stainless steel Pre-Steamer Bin Activator is used primarily in the pulp and paper industries both as a standard bin activator and also to presteam wood chips as a precursor to feeding them into the digester. Presteaming the chips dramatically increases the throughput of the digester resulting in reduced processing time, increased efficiency and improved mill profits. Features/Benefits. Wide Range of Sizes: 2' to 16' diameter. Special Stem Injection: for processing temperature... (read more)Browse Bin Activators and Discharge Aids Datasheets for Metalfab, Inc. -
Thermax Inc. - MA
Ambient Air Vaporizers (Natural Draft)Thermax provides a wide variety of ambient air vaporizers to match any application. The workhorse of the product line is the SuperGap vaporizer. These are constructed of an array of finned aluminum extrusions with a 12-inch center to center spacing providing for extended ice growth. The Ice Rack vaporizer is built specifically as a precursor to standard vaporizers to accumulate ice. Megafins, with a sixteen fin profile, provide the largest surface area per foot on the market. Stainless/Monel... (read more)Browse Vaporizers Datasheets for Thermax Inc. - MA -
Harper International Corporation
Unique Furnace Solutions - Mesh/Rotary ComboHarper specializes in innovative continous thermal processing solutions for unique atmospheres and at temperatures up to 3000°C. Customers worldwide trust Harper due to our ability to deliver the most custom systems available for advanced materials processing. In just one forward thinking example, Oak Ridge National Laboratory (ORNL) came to Harper to solve a special problem. ORNL is researching the development of a wide range of carbon materials from renewable resources. Precursor materials... (read more) -
Owlstone Inc.
OVG-4 Chem Agent / Explosive calibration standardand explosive standard for testing and calibration. 3. That's it. You are now ready to test your sensors and instruments against traceable, precise and repeatable CWS and explosive standards. DMMP - dimethyl methyl phosphonate, nerve agent (G agents) simulant. MS - methyl salicylate, H-variants (vesicants) simulant. DNT - 2,4-dinitro toluene, TNT precursor. DMNB - 2,3-dimethyl-2,3-dinitro butane, Semtex taggant... (read more)Browse Gas Generation Equipment Datasheets for Owlstone Inc.
Conduct Research
-
MICRO: TechEmergent
, improving throughput and overall cost-effectiveness. Material. k-Value. SiO2. Al2O3. Hf5Si5O2 (1:1). 15. HfO2. 25. Table I. Materials for DRAM capacitor dielectrics and their dielectric constants. HfxSi1-xO2 Films. As listed in Table I, several potential candidate materials can be used...
Engineering Web Search: HfO2 Precursor
|
HfO2 Gate Dielectrics Deposited via Tetrakis Diethylamido... HfO2 Gate Dielectrics Deposited via Tetrakis Diethylamido Hafnium J. Schaeffer, N.V. Edwards, R. Liu, D. Roan, B. Hradsky, R. Gregory, J. Kulik, E. See Electrochemical Society (The) Information |
|
|
Structural and electrical properties of HfO2 films grown by... Structural and electrical properties of HfO2 films grown by atomic layer deposition on Si and Ge S. Spiga*, M. Fanciulli, C. Wiemer, G. Scarel, G. |
|
|
Hafnium(IV) chloride - Wikipedia, the free encyclopedia Zircon contains 0.05 to 2.0 percent Hafnium oxide HfO2, cyrtolite with 5.5 to 17 percent HfO2 and baddeleyite contains 1.0 to 1.8 percent HfO2.[1 |
|
|
Study of the Reliability Impact of Chlorine Precursor Residues... Study of the Reliability Impact of Chlorine Precursor Residues in Thin Atomic-Layer-Deposited $\hbox{HfO}_{2}$ Layers |
|
|
Interfacial Properties of HfO<inf>2</inf>/ SiN/Si Gate... The SiN films were deposited by electron cyclotron resonance chemical vapour deposition (ECR-CVD) using N2 and SiH4 as precursor gases. |
|
|
ST | STMicroelectronics, CEA-Leti and AIXTRON Develop... of classical MOCVD, those of the precursor-pulsed deposition mode: high throughput (>20 wafers/h @ 5 nm of HfO2), atomic precision of the deposition |
|
|
Effects of UV Irradiation on Microstructure and Properties... Effects of UV Irradiation on Microstructure and Properties of HfO2 Films Prepared from Alkoxy-Derived Precursor Solution |
|
|
METHOD AND APPARATUS FOR USING SOLUTION PRECURSORS FOR ATOMIC... vaporized precursor solution and a vaporized reaction solution to a deposition chamber;forming a monolayer of components of the precursor solution |
|
|
Supplementary information for the Appl. Phys. Lett. article... Growth parameters for HfO2-shell deposition The HfO2 deposition is performed by Atomic Layer Deposition (ALD). The Hf precursor is |
|
|
Research 1. Precursor Design - the precursor materials are specifically designed to have high volatility and thermal reactivity at the furnace temperatures. |
More >>
