Products/Services for I Line Lithography
I/Q Modulators and I/Q Demodulators - (69 companies)
I/O Modules and Instruments - (520 companies)
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Line/Load Reactors - (34 companies)
Power Line Network Equipment - (30 companies)
Power or Line Conditioners - (230 companies)
Product News for I Line Lithography
Advance Cutting Systems, Inc.
ACS announces the i-Fold duct coil line AutoFold-iFold. The i-Fold can produce the following: Flat sheet cut to length blanks. "L" Sections. "U" Sections. _________________________________________________________________________. Fully Wrapped Duct Sections. The i-Fold offers most of the functionality of a conventional coil line with the advantage of a vastly reduced floor space requirement (6ft 6in x 10ft). . The i-Fold allows the operator to use standard coil widths, in multiple gauges up to 16ga, and manufacture... (read more)Browse Roll Forming Machines Datasheets for Advance Cutting Systems, Inc.
Network I/O Acromag's network I/O products provide a variety of remote I/O and distributed control solutions on many of the popular fieldbuses. Analog and discrete I/O modules interface sensors and actuators to controllers on Ethernet, Modbus, Profibus, and Hart networks. Ethernet I/O Solutions. EtherStax and BusWorks I/O modules support Modbus TCP/UDP/IP, Ethernet/IP, and Acromag's own i2o peer-to-peer networking protocols. A line of industrial Ethernet switches is also available. Modbus I/O Solutions... (read more)Browse Network Equipment Datasheets for Acromag, Inc.
Advance Cutting Systems, Inc.
The i-Fold Can't Be Beaten! AutoFold-iFold. The i-Fold can produce the following: Flat sheet cut to length blanks. "L" Sections. "U" Sections. Fully Wrapped Duct Sections. The i-Fold offers most of the functionality of a conventional coil line with the advantage of a vastly reduced floor space requirement (6ft 6in x 10ft). The i-Fold allows the operator to use standard coil widths, in multiple gauges up to 16ga, and manufacture ductwork from a minimum of 5in x 5in. The fully hydraulic system is controlled by the AutoFold... (read more)Browse Roll Forming Machines Datasheets for Advance Cutting Systems, Inc.
I Series Linear Actuator Exlar's roller screw technology has been the integral component in creating the most reliable, long lasting electromechanical actuators on the market. For the last 15 years, Exlar's inverted roller screw actuators have provided a long-life, all-electric replacement for hydraulic cylinders in thousands of applications. I Series Features. Proven Exlar roller screw technology. Flexible mounting options. Adapts to various types of motors. Optional inline planetary gear reducer for high force output... (read more)Browse Linear Actuators Datasheets for Exlar
MY-TE Products, Inc.
I-Beam Electric Winch-Hoist For all-purpose lifting, long-lift applications where a chain hoist will not reach, and in-plant operations where a hoist hanging from an I-beam supports the load. 1,000-lb single-line or 2,000-lb double-line lift. FEATURES. *115V brake motor. *Worm gear reduction for positive load holding. *Dynamic braking for instant stopping. *Low headroom —15" single line, 19" double line. *Trolley built to beam size. *Hoist complete with cable hook and block for 20' lift. *Upper/lower adjustable (read more)Browse Industrial Hoists Datasheets for MY-TE Products, Inc.
Microscan Systems Incorporated
I-PAK Packaging Inspection Tools on the powerful Visionscape software, I-PAK offers a comprehensive selection of proven vision processing tools. The I-PAK user interface makes setup and deployment of applications fast and easy, and allows 100% verification of every product on the line. Fail-Safe Identification: I-PAK provides fail-safe identification of incorrect or illegible characters while tolerating normal print variation. Proven robust OCV algorithms adapt to acceptable changes in pre-printed or overprinted codes... (read more)Browse Machine Vision Systems Datasheets for Microscan Systems Incorporated
Mesta Electronics, Inc.
Series I Uninterruptible Power Supplies built into every Mesta UPS. On-line/Utility Interactive Technology. The Series I UPS uses on-line/utility interactive technology, responding instantaneously to any fluctuations in the line or load, without any interruption. This technology also applies to Mesta's 3 Phase UPS systems. Improves Power Factor and Minimizes Harmonic Distortion. The unique Mesta UPS, improves power factor and minimizes line harmonic distortion. The result is outstanding protection for your critical equipment, as well... (read more)Browse Uninterruptible Power Supplies (UPS) Datasheets for Mesta Electronics, Inc.
Alpha Technologies Ltd.
CXPS 57-2.0-i CXPS 57-2.0-i. -48 to -57Vdc eLimiter Converter System. Unique remote powering sub-system provides up to 48 individual 100VA power limited circuits maximizing power transfer to remote loads. Meets NEC class 2, IEEE 802.3at PoE and communication circuit requirements for limited power circuits reducing cabling costs. Each channel supplies steady 57Vdc output voltage independent of input voltage which enables to extend the reach of line powered indoor iDAS up to 2000ft. Robust overload... (read more)Browse DC-DC Converters Datasheets for Alpha Technologies Ltd.
I-Series Industrial Gas Analyzers For years, MIDAC has provided customized solutions for demanding gas analysis applications. This accumulated experience uniquely qualifies us to provide "total solutions" for virtually any gas analysis need - from environmental to industrial process applications. The versatility of I-Series gas analysis systems enables us to work with you to configure a system that will deliver precisely the information you need. Features: Simultaneous analysis of multiple compounds from ppb to percent levels... (read more)Browse Gas Instruments Datasheets for MIDAC Corporation
OMEGA Engineering, Inc.
OMEGA Introduces Compact Thermal Imager OSXL-I Omega introduces its new line of compact thermal imagers powered by FLIR®. The OSXL-I series (FLIR I Series) is a compact, lightweight, point-and-shoot camera with an easy-to-use focus-free lens. This CE compliant product stores up to 5000 jpeg images with a convenient thumbnail image gallery. The OSXL-I is much easier, faster and safer to use than infrared thermometers, and far more accurate. The 71mm (2.8") LCD color display makes it easy to read images and temperature data to help find... (read more)Browse Thermal Imagers Datasheets for OMEGA Engineering, Inc.
Unlike i-line photoresist, chemically amplified DUV resist forms an acid during the exposure step. Acid loss at the resist/air interface can then cause capping on the resist profile. Such a loss may be caused by a reaction with a base adsorbed from the air into the resist film or by acid evaporation...
Increasingly, DAC's are a limiting factor in nanopositioning resolution, especially in the latest millimeter-travel stages. A newly patented technology adds up to 10 bits of resolution to virtually any OEM DAC and popular PC analog I/O boards without hardware modifications and with full...
...of conventional. Among these areas of research, the one that has experienced. lithography.3-5. the most explosive growth is two-photon fluorescence. m i c r o s c o p y. ( w w w. n e w p o r t . c o m / TA C / A p p s N o t e 3 2 ) . Two-photon polymerization (TPP) is a serial process...
Samsung Electronics has placed a multimillion-dollar repeat order for PAS 5500/300B deep-UV and PAS 500/200B i-line steppers from ASM Lithography. The multiple systems are scheduled for delivery through 1997 to the South Korean chipmaker's most advanced 200-mm wafer fabs. The large order continues...
" A goldbricking DUV lithography tool can burn money at a rate of up to $150,000 per hour, according to Extraction's estimate. "For one particular tool at 150 grand an hour, that's a big chunk of revenues," Kinkead points out. The fact that Extraction's pilot-line chipmaking client didn't need to crate...
...which can resolve critical device layers down to 0.18 um. The DUV and i-line systems provide a mix-and-match solution for 0.22- to 0.18-um lithography processes. Unlike step-and-repeat technology, the step-and-scan approach minimizes lens distortion, with matching between the PAS 5500/400...
...the performance of i-line lamps in step-and-scan lithography systems. Massana receives $16.5 million in funding PALO ALTO, Calif. -- Massana Inc., a supplier of chips and intelluctual-property (IP) cores for the communications market, here today announced that it has received $16.5 million in its...
...are used for ink-jet printing and fuel injection applications. The medical industry has certainly benefited from spinoffs from other industries. For example, disposable micromachined sensors are now being used to monitor blood pressure in a patient's IV line or to support treatment after a brain trauma...
...patterned defect inspection system (KLA-Tencor, San Jose) running the advanced performance algorithm (APA). Both i-line and deep ultraviolet (DUV) Verithoro programmed defect masks from DuPont Photomasks were investigated. Although engineers have traditionally used shearing microscopes to measure...
...explains Henry Guckel, a micromachining pioneer. "Six years ago at a conference, I told my students that we should have copyrighted the pictures of our inventions because that was the only value of the devices they were making," says Guckel, IBM-Bascom professor of engineering and electrical...
Engineering Web Search: I Line Lithography
Photolithography - Wikipedia, the free encyclopedia
Photolithography (also termed "optical lithography" or "UV lithography") is a process used in microfabrication to pattern parts of a thin film or the
Microelectromechanical systems - Wikipedia, the free...
184.108.40.206 Electron beam lithography 220.127.116.11 Ion beam lithography 2.2.1 Lithography 18.104.22.168 Photolithography
Photolithography with a Twist Photolithography with a A...
Gray scale lithography with positive photoresist positive photoresist Process flow patterned grayscale exposure after ion milling ; (equal erosion of
E-Beam Lithography Procedure I, August 2004 Nanotech User...
E-Beam Lithography Procedure I, August 2004 Nanotech User Facility, University of Washington Electron Beam Lithography NPGS Off-Line Training Note
Sub-Lithographic Patterning Technology for Nanowire Model...
2 Si O Si Si N 3 4 Si N 4 3 4 Si (I) (I Si (I) (I 1st 1 Spacer pac s (II) (II CV C D V oxi D de oxi de depos de i pos ti t on and et o ch n and et -
Novel 0.2 mu m i-lithography by phase-shifting on the...
Devices Meeting 1991 [Technical Digest Item Title: Novel 0.2 mu m i-lithography by phase-shifting on the substrate (POST) Publisher Name: IEEE
Cost of ownership for advanced optical lithography
Keywords: i-line lithography advanced optical lithography IC wafer fab model wafer stepper wafer lithography equipment IC production environment
Exhibition Guide Exhibition: 26?27 February 2008 Conferences +...
(Mack) 8:30 am to 5:30 pm, $570 / 670 SC833 Lithography Integration for Semiconductor Back-End-Of-The-Line (BEOL) (Lin) 8:30 am to 12:30 pm, $315 /