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  • ICP Operations Guide: A Guide for Using ICP-OES and ICP-MS
    This guide is intended for anyone operating and preparing samples and standards for measurement using ICP (ICP hereafter refers to either ICP-MS or ICP-OES). Our last guide, Reliable Measurements: A Guide for Trace Analysts, focused upon the task of achieving reliable trace measurements by ICP
  • Using VPD ICP-MS to monitor trace metals on unpatterned wafer surfaces
    techniques, such as atomic absorption spectrometry (VPD-AAS), total reflection x-ray fluorescence (VPD-TXRF), and inductively coupled plasma mass spectrometry (VPD-ICP-MS). Sample preparation has traditionally been performed manually; this article presents results obtained from a semiautomated sampling
  • Micro: Implementing enhanced ICP-MS technology to attain SEMI Grade 5 purity levels
    into the ) as a Grade 4 specification. is widely used in semiconductor manufacturing, a next-generation (Grade 5) purity level of 10 ppt for 21 elements has already been proposed. Traditionally, inductively coupled plasma mass spectrometry (ICP-MS) has been the technique of choice for ultralow
  • A Validated Method of Direct Analysis: 13 Trace Elements Determination in Tea Infusions using the Agilent 7700x ICP-MS with Integrated Sample Introducing System in Discrete Sampling (ISIS-DS)
    Application Note: A Validated Method of Direct Analysis: 13 Trace Elements Determination in Tea Infusions using the Agilent 7700x ICP-MS with Integrated Sample Introducing System in Discrete Sampling (ISIS-DS).
  • Sample Introduction for ICP-MS and ICP-OES (pdf)
    This article discusses the key components of a typical liquid sample introduction system for inductively coupled plasma spectroscopy, and offers troubleshooting tips for problems commonly encountered by practitioners.
  • MICRO:July/August 98:Industry News:Order Desk
    VG Elemental has received orders from two South Korean companies for its Axiom high-resolution ICP-MS. Samsung is one of the companies purchasing the analysis system. Dongwoo Pure Chemicals, a manufacturer of semiconductor-grade acids, also has ordered an Axiom. In contrast to conventional
  • MICRO: Defect Analysis
    at the lowest possible detection limit. In the past, quadrupole inductively coupled plasma mass spectrometry (ICP-MS) analysis has been sufficient for many low-level measurements, although interfering molecular species may compromise the accuracy of such results. At masses below mass-to-charge 80
  • MICRO: Critical Materials
    , SEMI has proposed that some of the more critical chemicals should have 10-ppt purity levels. One method for performing trace-metal analysis involves the use of inductively coupled plasma mass spectrometry (ICP-MS). Over the last 10 years, Merck Electronic Chemicals (Darmstadt, Germany) has acquired 10

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