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Using VPD ICP-MS to monitor trace metals on unpatterned wafer surfaces
techniques, such as atomic absorption spectrometry (VPD-AAS), total reflection x-ray fluorescence (VPD-TXRF), and inductively coupled plasma mass spectrometry (VPD-ICP-MS). Sample preparation has traditionally been performed manually; this article presents results obtained from a semiautomated sampling
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MICRO: Defect Analysis
at the lowest possible detection limit. In the past, quadrupole inductively coupled plasma mass spectrometry (ICP-MS) analysis has been sufficient for many low-level measurements, although interfering molecular species may compromise the accuracy of such results. At masses below mass-to-charge 80
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MICRO:Extreme Silicon Part 1, by Larry W. Shive (Feb 99)
sampling equipment with standard inductively coupled plasma mass spectrometry (ICP-MS) analytical tools. In-line sampling is essential to the success of this approach because it minimizes contamination while maximizing the possible sampling rate. It is very difficult to manually sample a chemical bath
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MICRO: Products Extra!
has come up with a new method to determine trace-metal contaminants in semiconductor-grade phosphoric acid. Employing the high detection capability of the company's Model 7500cs reaction cell ICP-MS, the method can determine parts-per-trillion-level impurities for all SEMI-specified elements. Users
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MICRO: Critical Materials Delivery
levels of 49% HF. Figure 3: ICP-MS analysis results showing trace contaminant levels of TMAH. As the charts illustrate, the frequency of sampling and analysis was not identical for all chemicals. A judicious sampling scheme based on the consumption volume and nature of each chemical was developed
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MICRO:Product Technology News (March 2001)
standard configuration. In addition to its use with any ICP, the tool can be used with a noble gas or stable isotope mass spectrometer for solid sampling of semiconductor and other specimens. Specialty-Gas Heating System. Accurate Gas Control Systems. Soquel, CA. A high-powered heating system maintains
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Measuring and removing dissolved and colloidal silica in ultrapure water
gravimetry, colorimetry, graphite furnace atomic absorption spectroscopy (GFAAS), scanning electron microscopy (SEM), ion chromatography (IC), inductively coupled plasma mass spectroscopy (ICP-MS), and inductively coupled plasma atomic emission spectroscopy (ICP-AES). MICRO:May 97:Ultrapure Fluids
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MICRO: Critical Material-Wafers
by vapor-phase decomposition, inductively coupled plasma mass spectrometry (VPD ICP-MS); minority carrier lifetime, measured by microwave photoconductive decay (u-PCD); microroughness, measured by scanning force microscopy (SFM); and particles added, measured as light-point defects (LPDs) using a Surfscan