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Fast Camera Images of Flux Ropes During Plasma Relaxation
Abstract-Images of visible light emission from flux ropes during plasma relaxation are presented. Multiple images are used to gain insight into the dynamics of driven/dissipative plasma relaxation processes in finite-? plasmas. A fast-gated (40-200 ns) intensified charge coupled device (ICCD
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MICRO: Product Technology News (January 2001)
for investigating plasma activity and plasma interactions with organic, metallic, and composite substrates. The turnkey tool features an inductively coupled plasma cell integrated with both mass spectrometer ion mass/energy and Langmuir probe analyzers for characterization of process and surface interactions
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MICRO:Product Technology News (March 2001)
heated lines to the scrubber, lowering the cost of ownership. A deep-UV laser ablation system improves the ablation of all inductively coupled plasma optical emission spectroscopy (ICP-OES) and inductively coupled plasma mass spectroscopy (ICP-MS) materials. The UP-213 produces a fine-particle
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Product Technology News
integration enables the system to support a reduced 200-mm interface footprint. Rated at better than Class 1, the unit is compatible with the manufacturer's paperless Smart-Traveler lot-tracking system. The UltraMass 700 is an inductively coupled plasma mass spectrometer that delivers fully automated
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Miniature Linear Encoders
with copper/low-k materials. Building on the Aspen III Highlands, the system features a proprietary inductively coupled plasma source. Its bias capability enables independent control of ion energy and ion density at low pressures, minimizing damage to low-k materials. Performing low-k strip, barrier
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MICRO:Extreme Silicon Part 1, by Larry W. Shive (Feb 99)
'96 (Leuven, Belgium: IMEC, 1996), 21 24. 4. F Meyer, JB White, and M Radle, "Silicon Wafer Surface Metals Characterization Using Automatic Wafer Scanning and Inductively Coupled Plasma Mass Spectrometry," to be published in Semiconductor International (1999). 5. G Settembre and E Debrah, "Using
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MICRO: Critical Materials Delivery
with a closed, double-walled chemical-delivery system that does not provide access ports for taking chemical samples. For quality assurance purposes, a compromise protocol has been established in which inductively coupled plasma�Vmass spectrometry (ICP-MS) is used to analyze as-received
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MICRO:Semicon Southwest p.2 (Oct '99)
Bhatnagar and Tony Kaushal, Applied Materials; and Roy Brown and Joseph Rossin, Guild Associates Catalytic Decomposition of PFCs Shin Tamata, Hitachi Long-Term Evaluation of a Litmas "Blue" Inductively Coupled Plasma Device for Point-of-Use PFC and HFC Abatement Conducted at Motorola Victor Vartanian