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Ion Implantation Thermal Treatments
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Products/Services for Ion Implantation Thermal Treatments
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Heat Treating Services - (550 companies)Heat treating services perform thermal treatments to modify the properties of metals and metal alloys. Common processes include annealing, austempering, case hardening, conventional hardening, homogenizing, hot isostatic pressing (HIP), martempering... Search by Specification | Learn More -
Thin Film Coating Services - (226 companies)Thin film coating services apply very thin layers of specialized materials to part surfaces. They perform processes such chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, electrochemical deposition (ECD), plasma... Search by Specification | Learn More -
No Image AvailableSurface Engineering Services - (94 companies)...services are located across North America and around the world. Typically, they perform processes such as ion implantation, shot peening, laser peening, friction stir processing (FSP), isotropic surface finishing (ISF), and plasma treatment. Surface... Search by Specification | Learn More
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Ion Exchange Equipment - (365 companies)...streams and remove sugar from molasses. Factories also use ion exchange equipment to remove dissolved alkaline solids that can impede machine performance or reduce system life. Ion exchange demineralization is a two-step process that involves treatment... Search by Specification | Learn More -
No Image AvailableIon Exchange Resins - (32 companies)...electronics, food and beverage processing, hydrocarbon processing, municipal water supply, power generation, semiconductor processing, and waste treatment. Applications include water softening and water purification. Water softeners replace mineral ions... Search by Specification | Learn More
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Ion Selective Electrodes - (68 companies)Ion selective electrodes measure the potential of a specific ion in solution. This potential is measured against a stable reference electrode of constant potential. Ion selective electrodes (ISE) measure the potential of a specific ion in solution... Search by Specification | Learn More
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Ion Specific Electrode Meters - (93 companies)Ion specific electrode meters are millivolt meters that interface with ion selective electrodes (ISEs). These meters take the potential generated by the electrode and convert it into units of concentration. Ion specific meters are millivolt meters... Search by Specification | Learn More
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Thermal Cutoffs and Thermal Protectors - (59 companies)Thermal cutoffs and thermal protectors are nonresetting, thermally sensitive devices designed to protect domestic electrical appliances and industrial equipment from fire. They are sometimes described as thermal one-shot fuses. Thermal cutoffs... Search by Specification | Learn More
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Ion Lasers - (22 companies)Ion lasers function by stimulating the emission of radiation between two levels of an ionized gas. They provide moderate to high continuous-wave output of typically 1 mW to 10 W. Ion lasers (also known as gas-ion lasers) emit high-powered beams... Search by Specification | Learn More
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Thermal Oxidizers and Catalytic Oxidizers - (208 companies)...that can be applied to incineration as a method of pollution control for air polluted with small particles or combustible solids or liquids. Catalytic oxidization is an off-gas post treatment unit for control of organic compounds. Gas enters the unit... Search by Specification | Learn More
Product News for Ion Implantation Thermal Treatments
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Endress+Hauser, Inc.
Ion-selective electrode system CAS40DISEmax CAS40D is an ion-selective electrode system for the continuous measurement of ammonium and nitrate. The system consists of a sensor, electrodes and a transmitter (CAM40) with display and operating elements and is mounted on the basin rim. Up to two ion-selective sensors simultaneously measure the nitrate and ammonium in the activated sludge basin. The ion-selective electrode system ISEmax works directly in the activated sludge basin of the municipal waste water treatment plant without... (read more) -
Siemens Water Technologies
Wastewater Ion Exchange (WWIX) Servicealso owns and operates two, RCRA-certified central waste treatment and recovery facilities. These facilities accept both hazardous and non-hazardous waste (including spent ion exchange resins) and wastewaters. Learn more about our industrial waste treatment and recovery capabilities. (read more) -
Siemens Water Technologies
Ion ExchangeContinuous Deionization (CDI) Deionization is the process of removing ions from water. Our CDI® (Continuous De-Ionization) system is a chemical-free process for producing high-purity water using ion exchange membranes, resins and electricity. Continuous Electrodeionization (CEDI/ EDI) Continuous Electrodeionization (CEDI) is your safe, chemical-free way to take RO (reverse osmosis) water to a higher level of purity. Siemens Water Technologies offers patented CEDI systems to help purify RO water... (read more)Browse Ion Exchange Equipment Datasheets for Siemens Water Technologies -
Res-Kem LLC
Ion Exchange Resins-Dow-Purolite-Sybron-ThermaxRESIN EQUIVALENCY CHART: The Res-Kem Resin Equivalency Chart will help determine which ion exchange resins for Purolite, Dow, Sybron/Lanxess, Thermax, Rohm & Haas, and Resin Tech. ION EXCHANGE RESIN APPLICATIONS: Res-Kem Corp offers a variety of ion exchange resins to suit just about any water treatment application including: Ultra Pure Water production. Water softening for Residential, Commercial and Industrial applications. Dealkalization. Condensate Polishing. Demineralization. Metals... (read more)Browse Ion Exchange Equipment Datasheets for Res-Kem LLC -
ANALYZE Inc.
Varian 500-MS Ion Trap Mass Spectrometer. Thermally labile organic molecules. In practice, the first step is to analyze the unknown with direct infusion and decide whether ESI or APCI is an appropriate ionization mode and which ion polarity to mass analyze. Subsequently, the experimental parameters can be optimized to provide the best S/N for the experiment. For example, antioxidants used to protect polymers from thermal oxidative degradation can be readily analyzed by APCI-MS. The MS/MS spectrum is often used to provide additional... (read more)Browse Chemical Testing Services Datasheets for ANALYZE Inc. -
Dow Water & Process Solutions
Case Study: DOWEX™ Ion Exchange Resinsthe move to submicron devices adds additional challenges. Research has shown that boron in process water can cause poor P-N junction and can reduce the production yield of submicron devices. Unfortunately, boron is difficult to remove with conventional water-treatment systems, and boron compounds can have negative effects on the water-treatment system itself. A specially designed system that focuses on boron removal requirements enabled Fab 30 to meet its ultrapure water (UPW) specifications. Click... (read more)Browse Ion Exchange Resins Datasheets for Dow Water & Process Solutions -
EEMB Battery
Lithium ion BatteryEEMB Lithium ion battery have lots of advantages as follows: · High Voltage and High Energy Density. · Long Shelf Life and Low Self-Discharge Rate. · Excellent Cycle life: (500 charge and discharge cycles can be expected under normal use). · No Memory Effect. · Environmental-Friendly. Model: LIR18650. Nominal voltage: 3.7V. Nominal capacity: 2200mAh. Internal impedance: ≦80m Ω. Approx. Weight: 47.0g (read more)Browse Rechargeable (Secondary) Batteries Datasheets for EEMB Battery -
Dow Water & Process Solutions
Basics of Ion ExchangeDOWEX ™ ion exchange resins include a broad line of cation and anion resins for use in multiple bed and mixed bed demineralization, condensate polishing, nuclear applications, as well as other demanding applications. The line of DOWEX resin products include both gel (or microporous) and macroporous resins, all incorporating uniform particle size (UPS) technology for improved resin bed kinetics and more efficient rinsing. Most DOWEX ion exchange resins are based on styrene copolymerized... (read more)Browse Ion Exchange Resins Datasheets for Dow Water & Process Solutions -
EEMB Battery
Li-ion Cylindrical BatteriesMain Feaetures: 1. High Voltage and High Energy Density. 2. Long Shelf-Life and Low Self-Discharge Rate. 3. Excellent Cycles Life. 4. No Memory Effect. 5. Eco-Friendly. 6. Nominal voltage: 3.7V. The batteries can be processed with cables and connectors according to customer's requirements. Customized battery packs are available. Main Applications including notebook, handy terminal, camcorder, PDA etc. (read more)Browse Rechargeable (Secondary) Batteries Datasheets for EEMB Battery -
Cell-Con, Inc.
Lithium Ion Battery PacksLithium ion batteries provide users with a high energy density solution that is lightweight and high in capacity. Providing a nominal voltage of 3.6 - 3.7V (three times the voltage of nickel based batteries), it permits the ability to make lighter, smaller devices in the portable equipment marketplace. Features include: high energy density, lightweight, high capacity. Over 500 cycles. No 'memory effect', providing a complete charge with each cycle. Flat discharge voltage, allowing... (read more)Browse Lithium Batteries Datasheets for Cell-Con, Inc.
Conduct Research
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Ion Implantation
(As) or antimony (Sb). A subsequent annealing treatment or thermal cycle is required to drive the implanted ions into the surface. Ion implantation can also be used to form wear resistant layers....
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MICRO: TechEmergent
Alex Salnik, Lena Nicolaides, and Jon Ospal, combination of ion implantation and thermal annealing, which are both silicon surface modification methods, is a key production process in semiconductor manufacturing. Thermal-wave (TW) technology measures surface modification (i.e., "damage") induced...
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MICRO: Green Manufacturing
sputter silicon or silicon dioxide (SiO ) from the wafer substrate and deposit residues on top of the resist. In addition, implant species can penetrate into the resist, causing the formation of a resist crust and other residues. Therefore, following ion implantation, the resist should be removed...
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MICRO: Product Technology News (January 2001)
in the flange area ensures mounting integrity. Ion Implanter. Axcelis Technologies. Beverly, MA. The MC3 medium-current ion implantation system for 300-mm semiconductor manufacturing is designed to meet both existing and future manufacturing requirements. The fully automated serial processing implanter...
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Eliminating heavily implanted resist in sub-0.25-um devices
will create significant technical and economic hurdles for the IC industry as technology enters the sub-0.25-um generations. Technology Roadmap Considerations The energy applications required to support the next three CMOS technology nodes (0.25, 0.18, and 0.15 um) in ion implantation have migrated...
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MICRO:April 98:Product Technology News
to 0.1% oxygen. Another model with a reading down to 0.1 ppm is available for critical applications. A rugged calibration knob, carrying strap, and a purging guide are standard features. CIS series closed ion gas analyzers provide a detection limit of 1 ppm for all gases and direct sampling...
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MICRO:Archive:Back Issue TOC
process controller, yield analysis software, gloves, noncontact measurement station, and microcleaving system Product Extra!: Tool company reaches second level in software capability model; ion implantation gases marketed as safe delivery source products; on-line vacuum store provides extensive data...
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MICRO: Product Technology News (October 2000)
. Plasma doping allows high productivity at low energies. In addition, the absence of ion-beam deceleration eliminates energy contamination that can affect device yields. By integrating the processes of particle acceleration, chemisorption, and recoil implantation, the plasma doping system produces...
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MICRO:Product Technology News (Jan '99)
at a scattered light detection level of 0.001 ppm/sr. In addition to defects caused by polishing, cleaning, and lapping, the system detects deposition-related flaws and defects introduced during processes such as ion implantation. Pressure Regulator Valcor Engineering Springfield, NJ Suitable...
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MICRO:Top 40 (Nov '99)
minutes at a scattered light detection level of 0.001 ppm/sr. In addition to defects caused by polishing, cleaning, and lapping, the system detects deposition-related flaws and defects introduced during processes such as ion implantation. Chemical Filter domnick hunter Durham, England The latest...
Engineering Web Search: Ion Implantation Thermal Treatments
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Microelectromechanical systems - Wikipedia, the free... 2.2.1.3 Ion beam lithography 2.2.1.4 Ion track technology electrostatics and wetting dominate volume effects such as inertia or thermal mass. |
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Glass - Wikipedia, the free encyclopedia The lower CTE also makes them less subject to stress caused by thermal expansion, thus less vulnerable to cracking from thermal shock. |
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Formation of Si-based light-emitting structures by ion... Formation of Si-based light-emitting structures by ion implantation and pulsed treatments |
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Towards p-type doping of ZnO by ion implantation Meeting of the IEEE Item Title: Towards p-type doping of ZnO by ion implantation Shortened Title: LEOS annual meeting ISBN: 0-7803-9217-5 Publisher |
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Cr ion implantation into Ti Part I. Formation of intermetallic... Title: Cr ion implantation into Ti Part I. Formation of intermetallic Laves phase Authors: L.M. Prudêncio, L. Paramês, O. Conde, R.C. da Silva |
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Ion implantation of Cs into silicon carbide: Damage production... Ion implantation of Cs into silicon carbide: Damage production and diffusion behaviour |
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Symposium J: Submission ID 43431 time 9:35 pm, Oct-30-00... Avenue, Murray Hill, NJ. Following high-energy and/or high-dose ion implantation into silicon, a vacancy-rich region can be observed close to the See Oak Ridge National Laboratory Information |
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Semiconductor Manufacturing - Main Index Basic operations of wafer fabrication, Doping, Heat treatments, Layering, Patterning, Chip Design, Packaging, Regions of a wafer surface, Edge Die, |
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ECS Transactions, 16 (8) 251-262 (2008) 10.1149/1.2982876 ?... Ion slicing consists of hydrogen (H) and/or helium (He) ion implantation into a donor wafer before bonding it to a handle wafer. |
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TRANSISTOR PERFORMANCE USING A TWO-STEP DAMAGE ANNEAL - Patent... 1. A method of thermal treating a semiconductor device, comprising:performing ion implantation in a silicon substrate of the semiconductor |
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