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Parts by Number Top

Part # Distributor Manufacturer Product Category Description
3RG78481AP Radwell Siemens Not Provided LASER ALIGNMENT DEVICE FOR LIGHT BARRIER
3RG78481AP Radwell Siemens Building Technologies Not Provided LASER ALIGNMENT DEVICE FOR LIGHT BARRIER
YD50PC2 Radwell Wenglor Not Provided LASER BARRIER
131100088 Radwell Rofin Sinar Safety Systems, Safety Barrier/Diode DIODE LASER MODULE

Conduct Research Top

  • Laser Scribing Thin Silicon Nitride Films
    conductive. Thin films of SiN refractory material are used to provide diffusion barriers, as a dielectric layer or for producing stable, electrically conductive metal contact layers. Many films are essential in both silicon based and thin film solar cell fabrication. In striving to reduce costs
  • Product Extra!
    for tungsten plug and aluminum fill as well as advanced Ta(N)/Cu barrier/seed processes for copper interconnects. The source provides uniform bottom coverage of high-aspect-ratio devices without the use of a collimator. (Semicon West, Yerba Buena Center) Laser thermal processing technology combines
  • What Engineers Should Know about Direct Digital Manufacturing
    direct metal laser sintering machines his company uses have a maximum working envelope of 10 x 10 x 7.5 inches. And while you can join rapid manufactured parts, secondary processes tend to offset some of the advantages of additive fabrication. So the larger number of whole parts you can squeeze
  • Medical Device Link .
    in 2000 with the mission of developing high-precision, high-speed laser micromachining equipment that requires minimal maintenance and supervision. During its initial few years, the company focused mainly on conducting research. But two years ago, Swiss Tec put an aggressive marketing strategy into action
  • MD&DI Web Site Directory- N-Z
    pressure sensors, stepper motors, stepmotor drivers, and controllers. Laser marking, Medcoat 2000, E-Co Brite, laser micromachining, wire EDM, CNC machining, pre-production development, prototype metal finishing, manufacturing support Norman Noble specializes in intricate, high-tolerance
  • MICRO: Behind the Mask
    Device specifications for critical dimensions (CDs) and CD uniformity have driven laser pattern generators to shorter wavelengths in order to enhance productivity and shorten cycle times. Current laser pattern generators operate in the range of 248 257 nm. Exposure doses at those wavelengths
  • Medical Device Link .
    of particles is presented to the surface of the test specimen. Airflow is generated through the test specimen, and laser particle counters enumerate the particles in both the challenge and filtrate aerosol streams. Particle enumeration in the challenge and filtrate streams can be performed sequentially
  • MICRO: The Hot Button
    nm. Research to date has established the feasibility of the technology, with no critical showstopper technical barriers. The next phases of R &D will require the availability of prototype exposure tools operating at the 193-nm wavelength of an ArF excimer laser. Such tools will allow for the initial

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