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  • Tips for Selecting the Best Direct Marking Method for Your Part (.pdf)
    success. Whichever method is chosen, whether it is Electro-Chemical Etch, Ink Jet, Laser Etch, or Dot Peen, it is important to review and experiment with as many methods as possible before selecting the appropriate one.
  • Compact Disk Cleaning: Cleaning Glass Master Disks - Aqueous Chemistry and Solvent Drying
    in a chemical solution that etches away areas exposed to the laser light and silver is thin deposited over the etched photoresist.
  • Blasted away
    Abrasive etching is an economical way to precision machine ceramics and other brittle materials. The Photo-Machining Process from Ikonics Corp., Duluth Minn., simultaneously etched 0.012-in.-diameter thru-holes in a thin silicon wafer in about 15 min. Laser drilling could take hours depending
  • MICRO: Archive: Back Issue TOC
    deposition controller, aqueous develop/etch tool, excimer laser micromachining, sample-preparation platform, stainless-steel gas springs, wireless autoleveling sensor, wireless maskmaking sensor, linear CD source, FPD measurement tools, mask metrology system Vendor offers RF atom source/RF ion source
  • Medical Device Link .
    Unconventional Machining Options Make Their Mark Chemical and laser processes shine in shaping thin parts. You designed it thin. Now you have to make it thin. How are you going to do it? While considering your options, don�t forget about a pair of effective, but sometimes overlooked
  • MICRO:Defect Inspection Equipment, by Thomas Reuter (Oct '99)
    low-angle laser illumination and dark-field collection optics. While drawing on the design of its predecessor, the new inspection tool offers enhanced sensitivity and throughput. Developed to meet the inspection requirements of 0.18- um design rules and
  • MICRO:Product Technology News (March 2001)
    heated lines to the scrubber, lowering the cost of ownership. A deep-UV laser ablation system improves the ablation of all inductively coupled plasma optical emission spectroscopy (ICP-OES) and inductively coupled plasma mass spectroscopy (ICP-MS) materials. The UP-213 produces a fine-particle
  • MICRO:Product Technology News (Oct '99)
    Matrix S200 metrology systems for CMP and etch provide application-specific sets of metrology techniques. The S200 CMP system has a 5 ' 10-mm-spot, 633-nm HeNe laser ellipsometer for measuring on-product substrate n and k and a 2.5-mm-spot, 470 905-nm reflectometer for measuring film thickness
  • MICRO:Archive:Back Issue TOC
    pellicles Siemens, Intel, Macronix to build Thai fab; Mitsubishi, Honeywell form wet-process chemical alliance; Komatsu, Ushio launch excimer laser business Motorola opens Romanian center; Lytron hires AMS Thermotech as UK distributor BOC Edwards, Pelchem to build plant in South Africa DRAM production
  • MICRO: Prod Tech News
    compromising throughput. Configurable and extendable across several technology generations, the tools offer sensitivity and throughput improvements over traditional laser scattering systems, enabling chipmakers to implement higher sampling strategies to protect wafers in process. With multiple