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  • MICRO: Product Technology News (October 2000)
    . The semiaqueous residue remover EKC660 for cleaning postetch residue in sub-0.18-um semiconductor devices is offered as an alternative to hydroxylamine. Its semiaqueous chemistry cleans vias as well as metal lines without attacking metals or oxides and causing critical dimension loss. The cleaner makes possible
  • MICRO:Product Technology News (April '2000)
    source, and a special angular-energy filter, which deflects the beam by 15 and can keep chemical contamination below metrology detection levels. An 80% aqueous ash-residue remover cleans a wide variety of metal-organic residues from substrates, including copper and low-k dielectrics. REZI-38

Engineering Web Search: Metal Oxide Remover Top