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  • MICRO: Ad hoc metrology
    For Brad Van Eck and the other members of the Integrated Measurement Association (IMA), the benefits of incorporating metrology in semiconductor processes are beyond question. Their next steps are figuring out the most efficient methods, and then convincing the authors of the International
  • MICRO: Metrology Start-ups
    Metrology start-ups, spin-offs turned up business in downturn So, here's the big picture: a flabby national economy, an industry barely out of a prolonged slump, a transition to a larger wafer size, transistor shrinks, the introduction of new process materials. In other words, it's a great time
  • Microsurface Metrology: The Key to Process Control
    Microsurface metrology is important today be-cause of manufacturing's smaller operating clearances, tighter tolerances and multiple processing setups. Consumers want more efficient, more reliable, and more durable products that cost less.
  • MICRO: Defect/Yield Analysis & Metrology
    A joint study reveals that optoacoustic metrology can be used to optimize chemical-mechanical planarization processes and track film-thickness variations during production. ith the IC industry rapidly switching to copper for circuit interconnects, the lack of etching techniques to remove copper has
  • Optical Metrology for Large Telescope Optics
    metrology applications. "Meter-class" describes a category of telescopes with optical elements larger than one meter in diameter, typically operating within the infrared through visible spectra. The primary and secondary optics may be monolithic glass structures or may consist of multiple segments that can
  • MICRO: Integrated metrology beginning to measure up to expectations
    Integrated metrology beginning to measure up to expectations Linewidths aren't the only things that are shrinking in the semiconductor industry. Put profit margins in that category, too, asserts Bob Johnson. The principal analyst for Gartner Dataquest says the reasons for this squeeze are fairly
  • MICRO: Defect Analysis and Metrology - Ge (Feb 2000)
    Larry M. Ge, formerly of Digital Instruments, Veeco Metrology Group Digital Instruments, Veeco Metrology Group Driven by the critical need for product yield management and process control of deep submicron silicon device manufacturing, defect engineering has become increasingly important. Commonly
  • Infrared Wire Grid Polarizers -Metrology and Modeling
    Broad and narrow-band wire grid polarizer (WGP) products suitable for MWIR and LWIR applications requiring high contrast were developed on antireflection (AR) coated silicon using Moxtek nanowire patterning capabilities. Accurate metrology was gathered in both transmission and reflection from

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