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  • Microsurface Metrology: The Key to Process Control
    Microsurface metrology is important today be-cause of manufacturing's smaller operating clearances, tighter tolerances and multiple processing setups. Consumers want more efficient, more reliable, and more durable products that cost less
  • Optical Metrology for Large Telescope Optics
    metrology applications. "Meter-class" describes a category of telescopes with optical elements larger than one meter in diameter, typically operating within the infrared through visible spectra. The primary and secondary optics may be monolithic glass structures or may consist of multiple segments that can
  • MICRO: Ad hoc metrology
    For Brad Van Eck and the other members of the Integrated Measurement Association (IMA), the benefits of incorporating metrology in semiconductor processes are beyond question. Their next steps are figuring out the most efficient methods, and then convincing the authors of the International
  • MICRO: Metrology Start-ups
    Metrology start-ups, spin-offs turned up business in downturn So, here's the big picture: a flabby national economy, an industry barely out of a prolonged slump, a transition to a larger wafer size, transistor shrinks, the introduction of new process materials. In other words, it's a great time
  • Advances in Interferometric Metrology
    in Interferometric Metrology. James C. Wyant. Optical Sciences Center, University of Arizona, Tucson, AZ 85721. jcwyant@optics.arizona.edu, http://www.optics.arizona.edu/jcwyant. ABSTRACT. Modern electronics, computers, and software have made interferometry an extremely powerful tool in many fields
  • MICRO: Defect/Yield Analysis & Metrology
    A joint study reveals that optoacoustic metrology can be used to optimize chemical-mechanical planarization processes and track film-thickness variations during production. ith the IC industry rapidly switching to copper for circuit interconnects, the lack of etching techniques to remove copper has
  • Non-Contact 3D Surface Metrology of Large Grain High Purity Niobium by SLCM and FESEM
    Abstract - Non-Contact 3D Surface Metrology of Large Grain High Purity Niobium by. SLCM and FESEM. Z.H. Sung, P.J. Lee and D.C, Larbalestier. Applied Superconductivity Center, National High Magnetic Field Laboratory,. Florida State University, FL, 32310. Microsoft Word - abstract_v1.2.doc
  • MICRO: Integrated metrology beginning to measure up to expectations
    Integrated metrology beginning to measure up to expectations Linewidths aren't the only things that are shrinking in the semiconductor industry. Put profit margins in that category, too, asserts Bob Johnson. The principal analyst for Gartner Dataquest says the reasons for this squeeze are fairly

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