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  • MICRO: Ad hoc metrology
    For Brad Van Eck and the other members of the Integrated Measurement Association (IMA), the benefits of incorporating metrology in semiconductor processes are beyond question. Their next steps are figuring out the most efficient methods, and then convincing the authors of the International
  • MICRO: Metrology Start-ups
    Metrology start-ups, spin-offs turned up business in downturn So, here's the big picture: a flabby national economy, an industry barely out of a prolonged slump, a transition to a larger wafer size, transistor shrinks, the introduction of new process materials. In other words, it's a great time
  • MICRO: Defect/Yield Analysis & Metrology
    A joint study reveals that optoacoustic metrology can be used to optimize chemical-mechanical planarization processes and track film-thickness variations during production. ith the IC industry rapidly switching to copper for circuit interconnects, the lack of etching techniques to remove copper has
  • Optical Metrology for Large Telescope Optics
    metrology applications. "Meter-class" describes a category of telescopes with optical elements larger than one meter in diameter, typically operating within the infrared through visible spectra. The primary and secondary optics may be monolithic glass structures or may consist of multiple segments that can
  • Imaging Colorimetry: Accuracy in Display and Light Source Metrology
    The need to support higher production quantities for display-based devices, together with escalating consumer demands for quality and competitive pressure, requires a metrology system that can provide manufacturers with high speed, accurate measurements of display and source luminance, color
  • MICRO: Integrated metrology beginning to measure up to expectations
    Integrated metrology beginning to measure up to expectations Linewidths aren't the only things that are shrinking in the semiconductor industry. Put profit margins in that category, too, asserts Bob Johnson. The principal analyst for Gartner Dataquest says the reasons for this squeeze are fairly
  • MICRO: Defect Analysis and Metrology - Ge (Feb 2000)
    Larry M. Ge, formerly of Digital Instruments, Veeco Metrology Group Digital Instruments, Veeco Metrology Group Driven by the critical need for product yield management and process control of deep submicron silicon device manufacturing, defect engineering has become increasingly important. Commonly
  • Infrared Wire Grid Polarizers -Metrology and Modeling
    Broad and narrow-band wire grid polarizer (WGP) products suitable for MWIR and LWIR applications requiring high contrast were developed on antireflection (AR) coated silicon using Moxtek nanowire patterning capabilities. Accurate metrology was gathered in both transmission and reflection from

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