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  • MICRO: Products
    The Model 5200 PanelPrinter system performs advanced photolithography for large-area substrate applications that require 0.8 -4- um resolution. Fully integrated subsystems include a high-fidelity projection lens and illumination system, a precision x-y stage, an automated substrate-alignment system
  • MICRO: ITRS
    Interim edition includes no surprises, sets stage for 2005 As expected, no surprises lurk in the 2004 update of the semiconductor industry's technological guidebook. The 14 technology working groups reviewing the document determined that the 2003 version of the International Technology Roadmap
  • MICRO: Products
    continuous-motion stage, which uses air bearings in vacuum, reducing vibration levels. The OD optical displacement sensor is a sensing and measuring system in one package. The OD performs ultraprecise measurements and detects the presence of even very small objects. The instrument works on the principle
  • MICRO: Products
    . The SB250 has a stage travel range of 210 x 210 mm , allowing operators to expose masks up to 7 in. and wafers up to 200 mm in diameter. Other features include a field-proven 50-keV shaped-beam column, write-on-the-fly writing mode, and fully automatic substrate handling. The system can be used
  • MICRO: Spotlight
    when planarization is reached, preventing overpolishing. (S.F., South Hall, Booth 417) The HPS Integrated LoPro (ILP) two-stage valve from is a vacuum poppet valve and a bypass valve in a single unit. The valve's compact size and ultracompact limit-switch option assure that it will fit into tight
  • MICRO: 300-MM Imperative
    operated fab will be located in Taoyuen, Taiwan. By the second half of 2004, the partners expect to process approximately 20,000 wafers per month in the first stage of production at the site. As another
  • MICRO: Product Extra!
    allows lithographers to use the company's standard PhotoKleen EZD-2 filter capsule with the P-Nylon filter media on two-stage pump systems. The slide version of the adapter allows for quick and easy fit-up into existing installations, requires minimal tool interruption, and can be used as a fast
  • MICRO: World Beat
    TSMC has ordered the first preproduction immersion lithography (IML) system from ASML. Delivery of the tool to the Taiwanese foundry giant is expected during 3Q04. The XT:1250i, a "wet" version of the Dutch lithography company's existing dual-stage, 193-nm-wavelength Twinscan XT:1250 platform, uses

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