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Microelectronic Metrology Monitor

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  • MICRO:Archive:Back Issue TOC
    first; FOUP sales set record; Genus sells first ALD tool Seiko Epson inks SOI pact; Partners offer software; Ibis ups wafer capacity; Brooks buys SEMY; Lambda opens service center; Semtech exiting foundry biz; Chem vendors expands to Asia SCP Global Technology, SPIE's Symposium on Microelectronic...
  • MICRO: 2001 Back Issues
    ; Extraction focuseson contamination; Mattson to sell CVD unit; Ibis, MEMC form wafer team; TEL buys software vendor. Whats going on: Clean Tech 2001, SPIE Microelectronic and MEMS Symposium, and more. Round the Circuit: Axcelis touts implant advance; NIST develops optics device; University of Arkansas...
  • What drives defect detection technology?
    , engineers focus on solving fundamental process problems, relying primarily on in-line metrology and electrical data from microelectronic test structures. Defect inspection becomes increasingly important once VLSI circuits are introduced into the process development effort, when inspection tools detect...
  • MICRO: Rebuilding Copperopolis - Biolsi (July 2000)
    use increases. Organic contamination is the least-studied source of defects, while scratches and dielectric film stress are common process-related problems. As geometries shrink, microelectronic fabrication processes become more complex, forcing semiconductor engineers to develop strategies...
  • MICRO:Product Technology News (March '99)
    a control loop as an alternative to a metering pump. An output signal indicates flow, which is steady, not pulsating. (Semicon Europa, Booth B1.105) Low-K Polymers AlliedSignal Advanced Microelectronic Materials Sunnyvale, CA Suitable for manufacturing semiconductors with 0.18-um geometries...
  • MICRO:March 1998:Product Technology News (p.122)
    capabilities. (Semicon Europa, Booth 647) Process Simulator Alberta Microelectronic Centre Edmonton, Alberta, Canada The UNIX-based Simbad program simulates the growth of thin metallic films over ULSI topography. The system uses a three-dimensional transport model combined with a two...
  • Product Technology News
    and nonlinearity is <0.5% FS. The pressure connection is a 1/8-in. NPT thread, and other options are being developed. Photoresists Olin Microelectronic Materials Norwalk, CT OiR 900-series positive photoresists provide fast photospeed and high lithographic performance for 0.4-um processes...

Engineering Web Search: Microelectronic Metrology Monitor

Interferometry - Wikipedia, the free encyclopedia

KLA Tencor - Wikipedia, the free encyclopedia
businesses served a segment of the inspection and metrology area; with KLA focused on defect inspection and Tencor placing its emphasis on metrology.
Industrial metrology and sensors
Industrial metrology and sensors Pub Year: 1989 Pub Date: 1989 Meeting
Application of the modified voltage-dividing potentiometer to...
voltage-dividing potentiometer to overlay metrology in a CMOS/bulk process Shortened Title: Microelectronic test structures ISBN: 0-7803-1757-2
Resist trimming etch process control using dynamic...
We show how these tools can successfully be used to monitor the resist etch process in an industrial chamber from Applied Materials equipped with an
A method of monitoring a surfactant in a microelectronic...
A method of monitoring a surfactant in a microelectronic process by fluorescence -> Monitor Keywords
Integrated microelectronic package stress sensor invention
Integrated microelectronic package stress sensor -> Monitor Keywords Site News | Monitor Keywords | Monitor Archive | Organizer | Account Info |
Conference Papers
Virtual Metrology Modeling for Plasma Etch Operations Authors: Dekong Zeng, Costas Spanos Presented: ISSM October 2008, Tokyo, Japan Paper available
Faculty Publications | EECS at UC Berkeley
A. R. Neureuther, "Probe-pattern grating focus monitor through scatterometry calibration," in Metrology, Inspection, and Process Control for
Metrology, Inspection, and Process Control for...
A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

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