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Nanometer Resolution Metrology System
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Surface metrology equipment is used to measure the surface finish and/or geometry of engineering components. Surface texture and topology characteristics include surface roughness, contour, form, waviness, and defects.
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Supplier: PI (Physik Instrumente) L.P.Description: P-733 XY and XYZ piezo driven stages are fast and highly accurate nanopositioning and scanning systems. They provide a positioning and scanning range of 100 x 100 (x10) µm together with sub-nanometer resolution and are equipped with parallel-metrology capacitive position feedback for superior
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Supplier: MSI-Viking GageDescription: The new MarSurf® UD 120 from Mahr Federal can generate both surface and contour measurements in a single pass. Designed for economy, the system provides high accuracy over a large measuring range in nanometer resolutions. The MarSurf UD 120 includes both automated motorized operation and joystick
- Technology: Non-contact - Optical / Laser
- Measurement Capability: Specialty / Custom
- Standards Compliance: ISO / EN
- Mounting / Loading: Benchtop
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Supplier: MicroSense, LLCDescription: to upgrade from existing 5810 systems – no design changes are required. The 6810 is ideal for use with our SpinCheck Metrology System – The 6810 is 100% compatible with existing and new SpinCheck systems. Existing SpinCheck customers can typically improve measurement resolution by 2X
- Technology: Capacitive Linear Position Sensor
- Output: Voltage
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Supplier: Aerotech, Inc.Description: a two-dimensional correction to achieve unmatched nanometer resolution, accuracy, and repeatability. This unique drive and bearing combination, packaged in an extremely low profile and small footprint, offers tangible advantages in your motion application. The ANT130-XY-ULTRA extends the performance capability
- Configuration: X-Y Axes
- Bearing / Guide Mechanism Type: Crossed Roller
- Drive Mechanism: None / Direct Drive
- Drive Type: None
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Supplier: Bruker Nano Surfaces DivisionDescription: resolution. The system's new Vision64 Operation and Analysis Software features the industry's most functional and streamlined graphical user interface to provide intuitive access to an extensive library of pre-programmed filters and analyses for solar, precision machining, printing, and medical metrology
- Application: Semiconductor Inspection
- Grade: Benchtop
- Microscope Type: Interferometric
- Image Analysis Processing Software: Yes
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Supplier: Polytec, Inc.Description: Polytec's TopMap Metro.Lab is an affordable, high-precision, non-contact topography measurement system designed to characterize flat and curved surfaces. Incorporating a scanning white light interferometer, the Metro.Lab can measure flatness and general topography with 20 nanometer resolution
- Measurement Capability: 3D / Areal Topography, Flatness, Parallelism, Roundness
- Technology: Non-contact - Optical / Laser
- Industrial Applications: Aerospace / Defense, Automotive, Other
- Mounting / Loading: Benchtop
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Supplier: PI (Physik Instrumente) L.P.Description: P-734 high-dynamics, XY piezo nanopositioning stages feature linear travel ranges to 100 x 100 µm with sub-nanometer resolution and maximum flatness of motion. P-734 open-frame XY nanopositioning and scanning stages are ideal for nanometrology tasks that require extreme flatness of scanning
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Supplier: PI (Physik Instrumente) L.P.Description: P-734 high-dynamics, XY piezo nanopositioning stages feature linear travel ranges to 100 x 100 µm with sub-nanometer resolution and maximum flatness of motion. P-734 open-frame XY nanopositioning and scanning stages are ideal for nanometrology tasks that require extreme flatness of scanning
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Supplier: MSI-Viking GageDescription: The new MarSurf® UD 120 from Mahr Federal can generate both surface and contour measurements in a single pass. Designed for economy, the system provides high accuracy over a large measuring range in nanometer resolutions. The MarSurf UD 120 includes both automated motorized operation and joystick
- Technology: Non-contact - Optical / Laser
- Measurement Capability: Specialty / Custom
- Standards Compliance: ISO / EN
- Mounting / Loading: Benchtop
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Supplier: MSI-Viking GageDescription: The new MarSurf® UD 120 from Mahr Federal can generate both surface and contour measurements in a single pass. Designed for economy, the system provides high accuracy over a large measuring range in nanometer resolutions. The MarSurf UD 120 includes both automated motorized operation and joystick
- Technology: Non-contact - Optical / Laser
- Measurement Capability: Specialty / Custom
- Standards Compliance: ISO / EN
- Mounting / Loading: Benchtop
Featured Products for Nanometer Resolution Metrology System Top
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Nanometer Resolution Sensor for Precision Mechanisms and Positioners - Ranges up to 500 µm. High accuracy, fast response - 0.02% full scale linearity is typical, with no cyclical error or hysteresis. Works with any conductive target, material or finish has no effect on accuracy. Directly measures the target with super-small sensor heads, eliminating Abbé offset errors. Easy installation - sensor head mounts in a simple precision hole. Serial communications port for "in machine" calibration... (read more) -
The new inductive sensor IPRM 12 measures with a resolution of up to 50 nm, which is to date unmatched in its class. All of the electronics are integrated in its 90 mm short M12 housing. At the same time, it is one of the fastest sensors in its class with a measuring speed of 1 mm/s. With these performance characteristics the compact sensor is a valid alternative to complex measuring systems. In contrast to these systems, the IPRM 12 does not need any external amplifier or expensive coaxial... (read more)Browse Inductive Proximity Sensors Datasheets for Baumer Ltd. -
Drawing of contexts, sections and site plans can easily consume a huge part of the total excavation time. For particularly complicated and detailed sites this can even rise to as much as half of the total project time. To increase the productivity of these dedicated activities, Nikon Metrology presents the Archeology variant of its iSpace large-scale metrology system. Trials at Mont Beuvray, France, have shown that the Archeology iSpace solution records data 50% to 90% faster compared... (read more)Browse Coordinate Measuring Machines (CMM) Datasheets for Nikon Metrology, Inc. -
Mahr Federal has expanded its offerings in the world of optical surface metrology with the introduction of the MarSurf ™ WS 1. Utilizing white light interferometry in a compact design, the MarSurf WS 1 offers vertical resolution of 0.1 nm (.004 µin) and provides three-dimensional measurement in only a few seconds. Utilizing MarSurf XT 20 topographical evaluation software, the space-saving MarSurf WS 1 can be configured to work both in the lab and on the shop floor. With the new processes... (read more)Browse Surface Metrology Equipment Datasheets for Mahr Federal Inc. -
The high demands of today's surface technology - very hard, very thin or visco-elastic - require correspondingly powerful measurement methods and systems. In the nano-meter range, the Fischer micro-hardness measuring instruments are capable of making quick, precise and effective measurements where classic measurement methods reach their limits. PICODENTOR® HM500 Measuring system for determining the Martens hardness (HM), characteristic elastic quantities and additional material parameters, even... (read more)Browse Hardness Testers Datasheets for Fischer Technology, Inc. / Coating Thickness Gages -
Metrology. To measure objects with precision, companies frequently turn to PixeLINK® machine vision cameras. Measure Complex Shapes. Organizations looking to measure irregular, complex or precision parts require a machine vision camera solution that offers a high frame rate, excellent image quality and high resolution. For these reasons, companies looking to develop metrology systems for electronics, semiconductors, or any complex manufacturing product choose PixeLINK® industrial cameras... (read more)Browse CCD Cameras Datasheets for PixeLINK -
Our cleanroom houses an array of custom designed system integrated metrology devices. Our cleanroom facility contains LVDT fulcrum beam measuring systems for high volume measuring of micron tolerances, twin sequential camera vision systems using parallel computer processors for defect identification and dual laser PLC full circumference parallelism and concentricity inspection. Throughout our factory are multi-stage ultrasonic cleaning stations, multiple dimensional diverging graders, single... (read more)Browse Surface Preparation Services Datasheets for Metal Cutting Corporation -
Cambridge Polymer Group, Inc. - Extensional Rheometer upgrades. Over five years ago Cambridge Polymer Group invented the Capillary Breakup Extensional Rheometer (CaBER®). CPG is pleased to announce a range of enhancements that greatly improve the flexibility of the instrument and the quality of the data generated. These enhancements are designed to interface with the existing commercial CaBER® currently marketed by Thermo Haake. Enhancements: Enhanced Resolution. New data acquisition system... (read more) -
turbine blades, appliance housings and much more. "The HN-6060 multi-sensor system builds upon the Nikon Metrology portfolio of vision systems and 3D solutions." says Myles Richard, Managing Director of Americas for Nikon Metrology, "It addresses the need for fast, high-accuracy 3D inspection of complex shapes by combining innovative optical technology with the highest precision measurement hardware." The newly designed laser scanning sensor extracts the surface form and waviness data in one... (read more)Browse Metallurgical Microscopes Datasheets for Nikon Metrology, Inc. -
Lapmaster International LLC presents the FTP 130 as a new product addition to its Metrology Line. The FTP 130 is a 3 way measuring system which accurately measures the flatness, thickness and parellelism of both 1 and 2 sided parts. Up to two different functions can be used simultaneously to measure parts as thin as 0.20mm or as thick as 200mm. It also comes with a new analog-digital display that elimates the possibility of any inaccuracies. This unit provides a very cost effective, compact... (read more)
Conduct Research Top
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MICRO: Defect Analysis and Metrology - Ge (Feb 2000)
developed by Digital Instruments, Veeco Metrology Group (Santa Barbara, CA) for point-defect characterization on silicon wafers. This system's. MICRO: Defect Analysis and Metrology - Ge (Feb 2000) MICRO...
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MICRO: Behind the Mask- Kasprowiez (Feb 2000)
Bryan S. Kasprowicz and Benjamin G. Eynon, metrology, the critical dimension scanning electron microscope (CD SEM) has long been the instrument of choice for measuring submicron features because of its nanometer-scale resolution and ever-improving throughput. Because photomask features historically...
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Nanopositioning with ALIO Ceramic Stages and Galil Controllers (.pdf)
. to sub-micron resolution is critical a ceramic stage coupled to a Galil controller is an. excellent motion control solution. This application note describes the actual hardware. that was used for a nanometer-level positioning system and the tips and tricks used to. achieve optimum results. Introduction...
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MICRO: Breakout/TEM Tool
Enhanced TEM tool used to break subangstrom image-resolution barrier A recent breakthrough in atomic-level analysis will help researchers in the development of advanced semiconductors and other nanometer-scale devices and materials. Scientists at FEI's nanotechnology center in Eindhoven...
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SmartMovesTM Spotlights: Veeco Instruments, Inc. (.pdf)
that is being measured. The user. nanometer resolution in a small footprint, uses one Galil. can select either phase shifting interferometry (PSI), a fast. DMC-3425. It enables cost-effective metrology for R&D as. method for measuring flat surfaces, or vertical scanning inter-. well as in producing MEMS...
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MICRO: Yield Analysis
Colin Yates and John Haywood, ; and Galen Sapp, Dmitry Gorelikov, and Paul Knutrud, As the IC industry approaches the 65-nm technology node, decreasing feature size and tightening requirements for dimensional control require a new approach to critical dimension (CD) metrology. Previously adequate...
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MICRO: Products
metrology for sub-100-nm design rules. By generating data that correlate to in-device overlay performance, the tool enables lithographers to improve process management and achieve tighter overlay control. In addition to reducing costly wafer rework and scrap, the system will help manufacturers...
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MICRO: Products
interferometry for Angstrom-resolution measurement of features from 0.1 nm to 2 mm in height. When equipped with the option, the profiler offers complete MEMS metrology on a single platform. The option performs dynamic measurements and static, white-light profiling of rough surfaces, capturing a series...
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MicroPositioning Fundamentals
MicroPositioning Solutions * Manually driven linear stages from with 6 to 150 mm travel * Optional piezo drives providing 1 nanometer resolution * Motorized translation stages from 5 to 306 mm (12") travel * Direct output metrology (integrated glass scales)for highest accuracy * Variety of drive...
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MICRO:Product Technology News (Oct '99)
Matrix S200 metrology systems for CMP and etch provide application-specific sets of metrology techniques. The S200 CMP system has a 5 ' 10-mm-spot, 633-nm HeNe laser ellipsometer for measuring on-product substrate n and k and a 2.5-mm-spot, 470 905-nm reflectometer for measuring film thickness...
Engineering Web Search: Nanometer Resolution Metrology System Top
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PI: Precision Capacitance Sensor, Capacitive Displacement... devices detect motion at sub-nanometer levels directly (direct metrology). They provide accuracy, linearity, resolution, stability and bandwidth See PI (Physik Instrumente) L.P. Information |
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Interferometry - Wikipedia, the free encyclopedia |
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Graphene - Wikipedia, the free encyclopedia |
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To be published in the Journal of Vacuum Science and... Nanometer-level repeatable metrology using the Nanoruler Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann, Chulmin Joo, Juan C. Montoya, Chih-Hao |
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Nanometer-accurate Grating Fabrication with Scanning Beam... Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, Chulmin Joo, and |
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The International System of Units (SI) m kg s SI cd mol K A... The International System of Units (SI) m kg s SI cd mol K A NIST Special Publication 330 2008 Edition Barry N. Taylor and Ambler Thompson, Editors |
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NIST Tech Beat - May 13, 2008 Credit: G. Koepke/NIST View hi-resolution image Both reports will be available on NIST?s Metrology for Wireless Systems Web page. See NIST (National Institute of Standards & Technology) Information |
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Atomic Force Microscope - Park Systems AFM,Research,Industrial Non-destructive Sample Scan 2008 : XE-3DM, New 3D AFM for High Resolution 3D Metrology 2009 : XE-Bio, New Bio AFM for Live Cell Imaging with Ion See Park Systems, Inc. Information |
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NPFLEX - Optical Interferometric Profilers: Bruker AXS NPFLEX 3D Metrology System NPFLEX 3D Surface Metrology System |
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ZMI Primer rev B Better Metrology.TM Outline ? DMI introduction ? Homodyne v.s. Heterodyne ? System components & configurations ? System error sources ? DMI |
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