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  • Precise Control of Dissolved O2 and N2 (.pdf)
    There is a trend in the semiconductor industry for precise control of oxygen and nitrogen concentrations in ultrapure water. Specifically there is a goal in the polishing loop of a semiconductor plant to control dissolved oxygen to low levels of 1 ppb or 5 ppb. At the same time it is important
  • Liqui-Cel (R) Membrane Contactors Improve Performance of Megasonic Cleaning (.pdf)
    in the system setup. First, a system containing Liqui-Cel Contactors could be located in the polishing loop. Here the typical dissolved gas requirement is less than 1 ppb for O2 and around 3 ppm for N2. Second, a Nitrogen blanketed tank could be located in the polishing loop. The typical dissolved
  • Spectroscopic Diagnostics of an Atmospheric Microwave Plasma
    for. molecular rotational and atomic excitation temperature (Trot, Texc) measurements are. being used for plasma studies. Initial chord averaged measurements have been made of. the N2. + (0,0) first negative system for Trot and Fe I levels for Texc in nitrogen and air. plasmas, respectively.

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