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Interferometers measure distance in terms of wavelength and determine the wavelengths of light sources.
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  • Optical Metrology for Large Telescope Optics
    metrology applications. "Meter-class" describes a category of telescopes with optical elements larger than one meter in diameter, typically operating within the infrared through visible spectra. The primary and secondary optics may be monolithic glass structures or may consist of multiple segments that can
  • Improved Interferometric Optical Testing
    Interferometry is used for testing optical components and optical systems as well as the metrology of many other components, such as the flatness and roughness of hard disk drive platters and the shape of magnetic recording heads and machined parts. This article describes three recent advances
  • Optical Shop Testing
    Equipment. Find Tektronix® Optical Test Equipment. View Info, Specs & More. www.tek.com. 4D Laser Interferometers. Vibration insensitive measurement of optical and precision surfaces. www.4dtechnology.com. Advertise on Amazon See a problem with these advertisements? Let us know. Frequently Bought
  • Comparing Tactile and Optical Technologies (.pdf)
    " representation of the surface being measured than the simple tracings of a probe. Microsoft Word - QualityWeb.doc. Comparing Tactile and Optical Technologies for Surface Texture Measurement. By Patrick Nugent. Vice President Metrology Systems. Mahr Federal Inc. A look at both of these technologies shows
  • MICRO: Defect/Yield Metrology - Schramm (October 2000)
    of the metal layers compensates for the low topography, so that enough optical signal is supplied to the metrology tool for adequate measurement. In front-end CMP processes such as STI, however, the registration marks are much more difficult to observe. Robust broadband optics with spatial filtering
  • MICRO: Defect Analysis and Metrology - Ge (Feb 2000)
    Metrology Group (Santa Barbara, CA) for point-defect characterization on silicon wafers. This system's dark-field optical microscope can locate defect events precisely down to 0.1 um and below (within 2 um), and the AFM tip can subsequently be positioned on individual defects and image the defects
  • MICRO: Integrated metrology beginning to measure up to expectations
    windows create the need for more CD measurements. In particular, for 248-nm lithography at the 130-nm process node, chipmakers "are pushing it right down to the hairy edge" in terms of measurement capabilities. Optical CD is emerging as an alternative to CD SEM, with a mix-and-match strategy likely
  • Optical Fiber Array With Precise Hole Sizing
    A method of making and an etchable wafer substrate for use in making optical fiber array plates includes forming a progressively increasing series of metrology holes when the plate holes are formed. The variation between designed plate hole diameter and actual plate hole diameter is determined

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