Optical Scanning Metrology Equipment

Conduct Research

• Automated Low Cost 3D Scanning
  Center for Advanced Technology Inc. All rights reserved. Future Plans • Experiment with different optical techniques/reconstruction algorithms to E i t ith diff t ti l t h i / t ti l ith t solve shiny part scanning without coating • Multi scanner setup for faster quality inspection • Large area...
• MICRO: Defect/Yield Analysis and Metrology - Poag(July 2000)
  . Additionally, a KLA-Tencor 2132 system is used for photocell monitor (PCM) analysis. Defect review stations include a KLA-Tencor CRS confocal station, INS-2000 optical stations from Leica Microsystems (Allendale, NJ), and several scanning electron microscopes. Two separate systems are used for analysis...
• MICRO:Process Equipment-Lithography, by Zhou Lin (Feb 99)
  in linewidth on processed control wafers and test wafers that have been exposed to the material. The original procedure adopted for such testing was cross-section scanning electron microscopy (SEM), which requires breaking wafers. A desire to reduce test wafer consumption while providing repeatable, quantified...
• MICRO: Behind the Mask- Kasprowiez (Feb 2000)
  and Benjamin G. Eynon, Photronics. The limitations of optical tools for small-dimension and phase-shift mask measurement dictate that photomask manufacturers consider a dual-tool metrology strategy. In semiconductor wafer dimensional metrology, the critical dimension scanning electron microscope (CD SEM) has...
• MICRO: Manufacturing Effectiveness
  available do not adequately detect defects at 90 nm and beyond, while scanning electron microscopes (SEMs) are too slow. With each successive technology node, critical dimension (CD) metrology measurements are becoming more difficult as the industry nears the limits of CD-SEM and optical critical...
• INDUSTRY NEWS
  techniques, optical transmissions microscopy, scanning force microscopy, and atomic force microscopy. The members will also assess the commercial viability of the prototype samples and offer suggestions that may lead to the development of a standard reference material traceable to NIST. Information...
• MICRO: Prod Tech news
  between the limits of conventional optical microscopes and scanning electron microscopes. The instrument combines a 408-nm laser with optics designed to operate at that wavelength to optimize image quality and limit aberrations. Accompanying software provides a simple user interface, fast processing...
• Evaluating sample preparation techniques for cleanroom wiper testing
  and recommend a measurement based on scanning electron microscopy (SEM). The use of SEM metrology for particle counting provides a method that is sufficiently sensitive to discern with great accuracy the number of particles released during sample preparation. However, the issue of how to prepare...
• MICRO: Defect/Yield Analysis
  critical. These smaller defects are harder to detect. Equipment suppliers have addressed this trend by developing increasingly sophisticated optical and laser-based tools offering some relief. Several suppliers have also developed scanning electron microscopy (SEM) systems that are appropriate...
• MICRO: Building Copperopolis II - Yang (May 2000)
  the performance of thermal processing equipment by conducting real-time measurements on product wafers, thus eliminating monitor wafers and minimizing rework or loss of product wafers as a result of out-of-control equipment. Thin-film optical metrology provides fast and precise real-time measurements...

Engineering Web Search: Optical Scanning Metrology Equipment