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  • Phase Holograms in Polymethyl Metacrylate
    value of phase delay. Following carefully controlled, partial development, the pattern appears, rendered in relief, in the PMMA which then acts as the phase-delay medium. The exposure dose was in the range 20-200 /iC/cm2, and very aggressive development in pure acetone led to low contrast
  • MICRO: Behind the Mask - Poortinga (June 2000)
    resists. In addition, the increasing acceptance and implementation of resolution enhancement techniques (RETs) such as optical proximity correction (OPC) and phase shift masks (PSMs) have extended the useful life of exposure tools while driving k1 levels lower than previously anticipated
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    downturn and competitive pressures from Intel Corp. Heard on the Beat (Oct. 5) Heard on the Beat (Oct. 5) Commentary & analysis of week's chip news, Oct. 1-5 ASML MaskTools to enter phase-shift and other software markets MONTEREY, Calif. -- ASM Lithography's MaskTools subsidiary here gave a sneak
  • MICRO: Product Technology News (April 2001)
    features. Nearly all photomask and wafer imaging variables can be evaluated at a rapid rate. Engineers can use the tool to view circuit-design data, clip pieces from the designs, process the data, and specify mask layers and types, such as binary or phase shift. They can make real-time modifications
  • EETimes.com | Electronics Industry News for EEs & Engineering Managers
    pending EPA approval NumeriTech revenue up 83% after IPO; loss results from phase-shift investments NEC steps up timetable to build two 300-mm fabs Nicolet x-ray imaging system combines advanced features at low cost SBN's earnings summary (April 17-21) USB 2.0 specification to spark new round of chips

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