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  • Medical Device Link .
    a photolithography system developed in the United States to fabricate implantable devices. Among the anticipated products are artificial hip and shoulder joints. The SF-100 maskless exposure system is designed by Intelligent Micro Patterning LLC (St. Petersburg, FL, USA). Based on a patented technology
  • A New Method for Creating Sloped Resist Profiles Using Mask Structures
    . If. have near-vertical sidewall profiles when the process focus. the etch non-uniformity is radial, this non-uniformity is. and exposure are optimized for critical dimension process. transferred first into the resist and then into the etched layer. control. In photolithography steps prior to metal
  • Medical Device Link .
    and test new ideas, while realizing reduced capital costs and a faster time to market with new products. Figure 2. A photo of the SF-100 maskless exposure system. Photolithography is the key process for transferring images to an electronic or microfluidic component and is used in manufacturing
  • Medical Device Link .
    (primarily for DNA). DNA synthesis methods include photolithography and electrochemical synthesis. For more than a decade, microarrays, especially those chips containing DNA, have been used in pharmaceutical research and development. Such devices have leveraged the efforts of the human genome
  • Medical Device Link .
    of photolithography processes in glass structures to produce microchannels has been widely publicized. Polymer-based materials, a lower-cost alternative to glass, offer specific advantages over glass structures and can be tailor-made for specific applications. The microfluidic channels can
  • MICRO: Product Technology News (April 2001)
    A simulation tool set enables photolithography engineers and IC designers to predict the manufacturability of their products before production. The LithoCruiser helps design and optimize lithography processes. It allows viewing of the lithography process windows based on the simulation of circuit
  • MICRO:Process Equipment-Lithography, by Zhou Lin (Feb 99)
    to shrink, this phenomenon and its effects on defect density and product yield have become an increasingly important concern. In response, both manufacturers and users of photolithography equipment must implement procedures that will help ensure that the process chamber remains free of molecular
  • Medical Device Link .
    , and photolithography. GMR resistors are generally patterned into serpentine resistors using photolithography. The serpentine configuration maximizes resistance per unit area. Maximizing resistance minimizes power consumption when the sensor is sampled. In a typical sensor, four GMR resistors are configured