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Cleaning Agents and Surface Treatments - Dynaloy Dynasolve 750 Cleaner Blue 1 qt Bottle -- DYNASOLVE 750 QUARTSSupplier: Ellsworth Adhesives
Description: Dynaloy Dynasolve 750 Blue is a solvent that is used to dissolve cured epoxies, photoresist films, silicones, and urethanes. It can also be used for cleaning industrial machinery. 1 qt Bottle.
- Type: Cleaner / Cleaning Agent
Supplier: Sensirion AG
Description: Tailored to the integration in demanding coating systems, the SLQ-QT105 is a semicon grade-sensor solution for flow rates of up to 120 ml/min of hydrocarbon based liquids like photoresists and solvents. Based on Sensirion's proven thermal microsensor technology, it opens new
- Type: Thermal Meter
- Process Media Type: Liquid
- Liquid Volumetric Flow Rate: 0.0 to 0.0317 GPM
- Operating Temperature: 68 to 77 F
Supplier: International Polymer Solutions Inc.
Description: Our IPS Suckback Valves are ideal for acid, solvent, photoresist solutions and other process dispensed chemistries. The IPS Suckback Valve will pull a vacuum and prevent excessive dripping from the dispensing nozzle. The IPS Suckback Valve is constructed of an“all wetted”
- Valve Size: 0.1250 to 0.3750 inch
- Pressure Rating: 30 psi
- Media Temperature: 185 F
- Connection: Threaded, Tube Fitting
Supplier: JST Manufacturing, Inc.
Description: are then sprayed with a second solvent to make sure all metal stringers that bridge the edge of the photoresist profile to the device are removed. Once this cycle is complete, the wafers are thoroughly rinsed in a clean solvent (IPA or acetone) and then dried in JST's patentedShow More
Supplier: Purolator Liquid Process
Description: . Configurations available to retrofit most industry standards. Bottled water, wine pre-filtration, wine final cellar filtration, beer filtration (trap filter), fruit juice, soft drinks, spirits, sugar solutions Process water pre-filtration, hot water heating systems, cooling water, coolingShow More
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Highest precision for measuring liquid flow
-based solvents such as photoresists, as well as water-based liquids such as TARC and H2O2. With the SLQ-QT500, liquids with virtually any viscosity as well as liquids which contain particles can be measured. This makes the sensor unique in the liquid flow sensor industry." (read more)
Browse Liquid Flow Meters Datasheets for Sensirion AG
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Compact Disk Cleaning: Cleaning Glass Master Disks - Aqueous Chemistry and Solvent Drying
cleaning could not be achieved. Ultrasonic cleaning lowers the production cost of compact discs, an important factor to the future growth of the CD market. The heavy glass substrate, approximately a foot in diameter, receives an ultrathin layer of adhesive and a photoresist coating. It is then exposed
MICRO: Sutton (April 2001)
as volume, dispense time, and spin speeds as well as the solvent type and the vapor primer were examined and found to be significant. Implementation of the solvent prewet technique for reducing photoresist dispense volumes was accomplished at the AMD fab using existing facilities and equipment
MICRO: Special apps
- coating efficiency. The efficiency values cited here were derived from tests on 100-mm silicon wafers. The article estimates resist costs only. It does not consider equipment- and maintenance-related costs. Photoresist has two main components: solids and solvent (or aqueous solution, in the case
MICRO: Critical Materials?Chemicals
Wafer processing requires the use of proper amounts of chemicals during photoresist, etch, planarization, and cleaning steps. Manufacturing steps demand that appropriate combinations of chemicals, temperature, and time be repeated for every process cycle. Abnormal flow conditions can create process
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Introduction to Semiconductor Manufacturing Technology
Viscosity of the photoresist can be controlled by the solid content of the photoresist solution .
Entrenched Metal Liftoff Using A Novel Bilayer Process
The modified photoresist solutions are prepared by dissolving enough cyclic phosphonitrilic chloride trimer, PNCT, in commercially available photoresist solutions to achieve phosphorus concentrations of 10 to 12 weight percent in the resulting films.
MEMS Materials and Processes Handbook
In some cases, the photoresist can be more difficult to remove, such as after successive baking steps or etching steps, and for these cases the photoresist manufacturers provide specific photoresist solvents , usually called “strippers,” or “resist removers.” .
Fundamental Principles of Optical Lithography: The Science of Microfabrication
Example: The photoresist solvent remaining after prebake has a significant impact on dissolution rates.
The exponent n typically has values around 1.5~2.5 for photoresist solutions [Jenekhe, 1983].
Handbook of SOLVENTS
Uses: Solvent for nitrocellulose, ethylcellulose, oils, dyes, gums, coat- ings, specialty finishes, inks, cosmetics; dipped latex prods.; diluents; adhesives; intermediates; photoresist solvents ; screen printing of elec- tronic parts; antiskinning agent; dry cleaning fluids; solvent for elec- tronics, coatings, inks, cleaning agents, mold …
Chemistry and Lithography
Figure 11.24 shows the change of fluorescence intensity (normalized to the pure ACRAM spectrum) with the addition of photoresist solution formulated from poly(CBN-alt-MAH) and TPSHFA (4.41 Â 1027 M).
Novolak Based Thermally Resistant Positive Photoresist: Resin Design and Performance
Photoresist solutions were prepared either in Aspect Systems System 8 -SC solvent or in ethyl lactate, bp.
Chemical analysis of electron beam curing of positive photoresist
Initially the electron beam reaction with the photoactive compound, like the UV reaction, makes the photoresist soluble in developers.
Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations
As a developer it is very selective and generally needs fluorinated photoresists or the presence of silicone to render a photoresist soluble in scCO2.