Products/Services for Photoresist Solvent
Cleaning Agents and Surface Treatments - (2108 companies)
No Image AvailableEtchers and Etching Machines - (55 companies)...gas or plasma, and solvents. The type of corrosive and masking materials used depends upon the etching application. For example, to manufacture semiconductor wafers, operators use a light-sensitive masking material called a photoresist and a strong... Learn More
Product News for Photoresist Solvent
Industrial Solvents Industrial Solvents. Hubbard-Hall offers a comprehensive line of solvent cleaning chemicals for precision and critical cleaning that can be used in vapor degreasing or ultrasonic applications. Solvents are very effective in dissolving oils, greases and waxes. Hubbard-Hall offers the traditional trichloroethylene (TCE), perchlorethylene and methylene chloride cleaning solvents along the newer n propyl bromide (nPB) cleaning solvents. Benefits of Organic Solvent Cleaning: Parts come out dry... (read more)Browse Cleaning Agents and Surface Treatments Datasheets for Hubbard-Hall, Inc.
FlexiSolv® products - Solvents for Adhesives FlexiSolv ® products provide an alternative to traditional solvents when slower evaporation is desired. DBE ® esters play an important role in adhesive applications. Its miscibility with most organic solvents and solvency for a wide range of resins makes it useful as a cleaning solvent for equipment. It also finds use as a carrier solvent in solvent-borne adhesive systems requiring a slow evaporating solvent in adhesive formulations. DBE ® esters can often be used as an effective... (read more)Browse Organic Solvents Datasheets for INVISTA
GFS Chemicals, Inc.
Veritas® Ultimate Solvents Features and Benefits: · Enhanced specifications for a wider range of critical applications. · Commitment to the highest purity requirements demanded for today's most discriminating needs. GFS Chemicals offers a wide selection of solvent grades including reagent grade and HPLC grade solvents. Products are distilled in glass or quartz. Each of our specialty solvents is carefully analyzed and certified to meet our published specifications. The quality of each solvent far exceeds... (read more)Browse Organic Solvents Datasheets for GFS Chemicals, Inc.
Global Testing Services, Inc.
Resistance to Chemicals and Solvents Testing Specification for Paint and Corrosion Protection: Cleaning Solvents. GM4350M- Painted Part Performance Requirements. GM6121M- Performance Requirements for Labels. GM9308P- Chemical Stress Resistance of Plastics. GM9500P- Gasoline Puddle Test for Gasoline Fill Areas. GM9501P- Gasoline Dip Test for Painted Parts. GM9509P- Solvent Rub Method for Determining Cure of Painted Metal or Plastic Substrates. GM9900P- Cleaning/Solvent Resistance of Automotive Components During Normal Customer Use. GME L0002... (read more)Browse Analytical Laboratory Services Datasheets for Global Testing Services, Inc.
Wilden Pump & Engineering, LLC
Wilden® Advanced™ Series Pumps For Solvents Wilden ® Advanced Series Stainless Steel AODD Pumps safely contain and transfer the most hazardous solvents, including trichlorethane, trichloroethylene, methylene chloride, methyl chloride, carbon tetrachloride and chloroform. . The Advanced Series Stainless Steel AODD Pumps provide superior containment since the pumps do not have a mechanical seal or packing that can fail and lead to costly leakage. The pumps also feature a bolted design and single-piece integral piston... (read more)Browse Double Diaphragm Pumps Datasheets for Wilden Pump & Engineering, LLC
Alternative Solvent for Degreasing Concrete FlexiSolv ® 1120C microemulsion concentrate offers the formulator of concrete degreasing products an excellent alternative to conventional hydrocarbon solvents. FlexiSolv ®microemulsions deliver the advantage of both aqueous and organic systems. Aqueous formulations deliver the cleaning power of an organic solvent, while the water dilutability allows for easy rinsing. With the ease of handling, product properties and near-neutral pH, FlexiSolv ® microemulsions... (read more)Browse Organic Solvents Datasheets for INVISTA
Rapid Solvent Evaporation This system is designed to rapidly evaporate/concentrate solvents by heating both the sample bottom and the incoming nitrogen. Each position is furnished with an individual orifice or needle for the best possible delivery of gas. The pulsing feature that is selectable allows a film of solvent to be thrown on the sidewall; then the vortex collapses. Next the vortex again is created and the process continues until the concentration level is achieved providing the quickest method of evaporation... (read more)Browse Evaporators Datasheets for Glas-Col, LLC
Wyssmont Company, Inc.
Drying with Solvent Recovery Compared with the batch solvent recovery dryers, which they often replace, these systems are safe, economical and continuous, and require almost no operator attention. Their design is built around the special features of the TURBO-DRYER®, which is uniquely able to operate at atmospheric pressure with inert gas as the drying medium in a closed system. These systems have a reputation for safety and reliability. Many customers with broad experience in drying equipment will consider only Wyssmont... (read more)Browse Process Dryers Datasheets for Wyssmont Company, Inc.
Solvent Free for Green Manufacturing! solution continually flushing away all soils and chips. The cleaning chamber is continually purged with fresh filtered solution more than twice every minute insuring even the most complex parts with blind holes are thoroughly cleaned. Soils, chips and oil are separated continually ensuring longer bath life. Lean-Clean 360-1 - Single Basket Rotary Industrial Parts Washer. Solvent Free Aqueous Part Washers for Green Manufacturing. Rotating Basket Parts Washers - LeanClean 360-2 Solvent Free Aqueous... (read more)
DuPont™ Capstone® Repellents and Surfactants
DuPont™ Capstone® Fluorosurfactants Solvent-Based The portfolio of Capstone ® fluorosurfactants for solvent-based systems consists of four multifunctional additives. These products can be used for a variety of applications and functions as summarized in the table below. (read more)Browse Chemical Additives and Agents Datasheets for DuPont™ Capstone® Repellents and Surfactants
...cleaning could not be achieved. Ultrasonic cleaning lowers the production cost of compact discs, an important factor to the future growth of the CD market. The heavy glass substrate, approximately a foot in diameter, receives an ultrathin layer of adhesive and a photoresist coating. It is then exposed...
...of. processing. being: Photoresist stencil on metal. · positive- or negative-working (Figure 4). Etching. · natural product- or synthetic polymer-based. · applied as a liquid (including electrophoretic. Etched metal. deposition) or dry film. · organic solvent- or aqueous-based formulations. Photoresist...
...tracks,. MEMS, ink jet print cartridges and various components in hard disk drives. The low surface. energy film repels liquids such as lubricating oils, silicones, and photoresist solutions used. in the manufacturing of semiconductors. Novec coating EGC-1700 will form a clear, nearly invisible...
- coating efficiency. The efficiency values cited here were derived from tests on 100-mm silicon wafers. The article estimates resist costs only. It does not consider equipment- and maintenance-related costs. Photoresist has two main components: solids and solvent (or aqueous solution, in the case...
...as volume, dispense time, and spin speeds as well as the solvent type and the vapor primer were examined and found to be significant. Implementation of the solvent prewet technique for reducing photoresist dispense volumes was accomplished at the AMD fab using existing facilities and equipment...
Joseph Zahka and Roger Blum, ash residue, and bulk photoresist are removed from wafer surfaces using various chemicals. While these chemicals are generally classed as mixtures of solvents, amines, corrosion inhibitors, and suspending agents, the specific formulations are often proprietary and can...
...they incorporate three-dimensional microstructures. While spin-coating technology is used to perform most photoresist deposition processes in the chipmaking area, it does not perform well on three-dimensional MEMS structures. The severe topography of MEMS devices, such as V-grooves, mesas, and etch cavities...
Wafer processing requires the use of proper amounts of chemicals during photoresist, etch, planarization, and cleaning steps. Manufacturing steps demand that appropriate combinations of chemicals, temperature, and time be repeated for every process cycle. Abnormal flow conditions can create process...
...the temper-. bridge damage.1,3,34 If the hotplate tech-. carcinogen, and room-temperature ace-. atures of both photoresist mask hard bake. nique is used, the dismounted thinned. tone to ATMI Vapure 200, an acetone. and the photoresist stripping bath had to. wafers are cleaned in solvent baths...
...for patterning a moving web with high precision and resolution include gravure, microgravure, industrial inkjet, photoresist techniques, and others. Choosing the right coating method for a specific product is crucial. The most common methods for roll-to-roll coating of printed electronics include gravure, slot...
Engineering Web Search: Photoresist Solvent
Photolithography - Wikipedia, the free encyclopedia
It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate.
Dimethyl sulfoxide - Wikipedia, the free encyclopedia
formula (CH3)2SO. This colorless liquid is an important polar aprotic solvent that dissolves both polar and nonpolar compounds and is miscible in a
Litho Processes: Lift-off
During the actual lifting-off, the photoresist under the film is removed with solvent, taking the film with it, and leaving only the film which was
EE-527: MicroFabrication Photolithography R. B. Darling /...
R. B. Darling / EE-527 Prebake (Soft Bake) - 3 ? Convection ovens: ? Solvent at surface of resist is evaporated first, which can cause resist to
Effect of heat and moisture on thick positive photoresist
Effect of heat and moisture on thick positive photoresist
Removal of post-etch photoresist and sidewall residues using...
Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces
Investigation on the effect of Metallic impurity Zn in Solvent...
Investigation on the effect of Metallic impurity Zn in Solvent during Photolithography process Byoung-Tak Jeona, Ook-Hyun Kim, Jeong-Heon Baik,