Products/Services for Photoresist Solvent
Cleaning Agents and Surface Treatments - (2136 companies)
No Image AvailableEtchers and Etching Machines - (58 companies)...gas or plasma, and solvents. The type of corrosive and masking materials used depends upon the etching application. For example, to manufacture semiconductor wafers, operators use a light-sensitive masking material called a photoresist and a strong... Learn More
Product News for Photoresist Solvent
FlexiSolv® products - Solvents for Adhesives FlexiSolv ® products provide an alternative to traditional solvents when slower evaporation is desired. DBE ® esters play an important role in adhesive applications. Its miscibility with most organic solvents and solvency for a wide range of resins makes it useful as a cleaning solvent for equipment. It also finds use as a carrier solvent in solvent-borne adhesive systems requiring a slow evaporating solvent in adhesive formulations. DBE ® esters can often be used as an effective... (read more)Browse Organic Solvents Datasheets for INVISTA
GFS Chemicals, Inc.
Veritas® Ultimate Solvents Features and Benefits: · Enhanced specifications for a wider range of critical applications. · Commitment to the highest purity requirements demanded for today's most discriminating needs. GFS Chemicals offers a wide selection of solvent grades including reagent grade and HPLC grade solvents. Products are distilled in glass or quartz. Each of our specialty solvents is carefully analyzed and certified to meet our published specifications. The quality of each solvent far exceeds... (read more)Browse Organic Solvents Datasheets for GFS Chemicals, Inc.
Opportunities for Greener Solvents The overall solvents market has been diminishing somewhat in the developed countries, mainly as a result of regulatory pressures to reduce emissions that tend to cause lower-atmospheric smog and that, in some cases, pose health threats. The opportunity to develop and market solvents with lower ecological and toxicological profiles is excellent, especially with the strong global "green" movement. However, the perfect solvent is not available. Tradeoffs have to be made regarding efficiency, cost... (read more)
Alternative Solvent for Degreasing Concrete FlexiSolv ® 1120C microemulsion concentrate offers the formulator of concrete degreasing products an excellent alternative to conventional hydrocarbon solvents. FlexiSolv ®microemulsions deliver the advantage of both aqueous and organic systems. Aqueous formulations deliver the cleaning power of an organic solvent, while the water dilutability allows for easy rinsing. With the ease of handling, product properties and near-neutral pH, FlexiSolv ® microemulsions... (read more)Browse Organic Solvents Datasheets for INVISTA
National Coating Corporation
Solvent Based Coating Services At National Coating Corporation, we provide solvent-based coating services, applying solvent-based coatings to foam, paper, woven fabrics, non-wovens and film substrates using knife coating or saturation techniques. National Coating Corporation is one of a small number of converters able to offer these services. We have major investments in capital equipment for VOC incineration, which allows us to process and handle solvents while meeting current and future EPA standards. Our investment... (read more)Browse Coating Services Datasheets for National Coating Corporation
Custom Processing Services, Inc.
Solvent based & Aqueous Dispersions Custom Processing Services - Laboratory, pilot and production size equipment are available to produce both solvent based and aqueous dispersions on a contract manufacturing basis through Custom Processing Services. For products that require particle size reduction or dispersion, proper development of the formulation and milling process are critical to successful manufacturing. Custom Processing Services offers a fully equipped lab to assist customers in the development... (read more)Browse Toll Processing Services Datasheets for Custom Processing Services, Inc.
Wyssmont Company, Inc.
Drying with Solvent Recovery Compared with the batch solvent recovery dryers, which they often replace, these systems are safe, economical and continuous, and require almost no operator attention. Their design is built around the special features of the TURBO-DRYER®, which is uniquely able to operate at atmospheric pressure with inert gas as the drying medium in a closed system. These systems have a reputation for safety and reliability. Many customers with broad experience in drying equipment will consider only Wyssmont... (read more)Browse Process Dryers Datasheets for Wyssmont Company, Inc.
Solvent Free for Green Manufacturing! solution continually flushing away all soils and chips. The cleaning chamber is continually purged with fresh filtered solution more than twice every minute insuring even the most complex parts with blind holes are thoroughly cleaned. Soils, chips and oil are separated continually ensuring longer bath life. Lean-Clean 360-1 - Single Basket Rotary Industrial Parts Washer. Solvent Free Aqueous Part Washers for Green Manufacturing. Rotating Basket Parts Washers - LeanClean 360-2 Solvent Free Aqueous... (read more)
AGC Chemicals Americas, Inc.
AsahiKlin AK-225 Precision Cleaning Solvents AsahiKlin AK-225 Precision Cleaning Solvents are environmentally sensible hydrochlorofluorocarbons designed to replace chlorofluorocarbons, perfluorocarbons and other HCFCs that have high ozone depletion potential. One-hundred percent free of VOCs (volatile organic compounds), the solvents have substantially lower global warming potential (370) than PFCs and HFCs, as well as an extremely low ozone depletion potential (0.03). Their selective solvency, physical properties and ability to form... (read more)Browse Cleaning Agents and Surface Treatments Datasheets for AGC Chemicals Americas, Inc.
A Fast & Mistake Proof Solvent Dispensing Coating System. The correct amount of fluid is automatically applied every time, regardless of who performs the operation. Features. Coats ID, OD or both surfaces simultaneously. Makes coating process less operator-dependent. Eliminates fluid contamination and waste. Ideal for semi-automated and fully automated processes. Closed tank reduces vapors. Greater process control. Can also be used for silicone oils. Compatible Fluids. Solvents. UV Adhesives. Solvent Coater. Data Sheet. Operating Manual... (read more)Browse Fluid Dispensing Equipment Datasheets for Nordson EFD
...cleaning could not be achieved. Ultrasonic cleaning lowers the production cost of compact discs, an important factor to the future growth of the CD market. The heavy glass substrate, approximately a foot in diameter, receives an ultrathin layer of adhesive and a photoresist coating. It is then exposed...
...of. processing. being: Photoresist stencil on metal. • positive- or negative-working (Figure 4). Etching. • natural product- or synthetic polymer-based. • applied as a liquid (including electrophoretic. Etched metal. deposition) or dry film. • organic solvent- or aqueous-based formulations...
...tracks,. MEMS, ink jet print cartridges and various components in hard disk drives. The low surface. energy ﬁlm repels liquids such as lubricating oils, silicones, and photoresist solutions used. in the manufacturing of semiconductors. Novec coating EGC-1700 will form a clear, nearly invisible, uniform...
- coating efficiency. The efficiency values cited here were derived from tests on 100-mm silicon wafers. The article estimates resist costs only. It does not consider equipment- and maintenance-related costs. Photoresist has two main components: solids and solvent (or aqueous solution, in the case...
...as volume, dispense time, and spin speeds as well as the solvent type and the vapor primer were examined and found to be significant. Implementation of the solvent prewet technique for reducing photoresist dispense volumes was accomplished at the AMD fab using existing facilities and equipment...
Joseph Zahka and Roger Blum, ash residue, and bulk photoresist are removed from wafer surfaces using various chemicals. While these chemicals are generally classed as mixtures of solvents, amines, corrosion inhibitors, and suspending agents, the specific formulations are often proprietary and can...
...they incorporate three-dimensional microstructures. While spin-coating technology is used to perform most photoresist deposition processes in the chipmaking area, it does not perform well on three-dimensional MEMS structures. The severe topography of MEMS devices, such as V-grooves, mesas, and etch cavities...
Wafer processing requires the use of proper amounts of chemicals during photoresist, etch, planarization, and cleaning steps. Manufacturing steps demand that appropriate combinations of chemicals, temperature, and time be repeated for every process cycle. Abnormal flow conditions can create process...
A bump fusion flux differs from a. photoresist material when spin-coating, even though they have. similar viscosities. For the bump fusion flux, lower rotational. times and speeds are needed to achieve a consistent coating,. due to the lower viscosity and solvent evaporation rate. Figure 8. Flux...
...by a one-photon process, the. excitation beam is usually greatly attenuated by linear. Two-photon polymerization principles. absorption before reaching the focal point. Consequently,. The excited state of a molecule can be reached by the. only the first layer of the photoresist (photosensitive. absorption...
More Information on: Photoresist Solvent
MEMS Materials and Processes Handbook
In some cases, the photoresist can be more difficult to remove, such as after successive baking steps or etching steps, and for these cases the photoresist manufacturers provide specific photoresist solvents , usually called “strippers,�? or “resist removers.�? .
Trace metal removal from microlithography process chemicals: Part I. photoresist solvents
Trace metal removal from microlithography process chemicals Part I: photoresist solvents .
Mathematical modeling and experimental study on photoresist whirl-coating in
convex-surface laser lithography
A mathematical model of the photoresist thickness distribution on a convex-surface substrate with respect to various experimental parameters such as the type of photoresist, the viscosity of the photoresist solution , the rotation speed of the spinner, the geometrical dimension of the...
Spray coating of photoresist for pattern transfer on high topography surfaces
Among them, the most important parameters are (1) Photoresist solution composition, i.e. the solids content of the spray solution and the solvent.
Photoresist as a sacrificial layer by dissolution in acetone
For this reason it is unlikely that a liquid in which photoresist and photoresist solvents are insoluble would be able to displace the solvent by wetting.
"Dry" lithography using liquid and supercritical carbon dioxide based chemistries and processes
Photoresist solutions for spin casting were prepared by dissolving 20 wt% of PFOMA- -THPMA in liquid CO .
Handbook of SOLVENTS
Prods.: Heated to decomp., emits acrid smoke and irritating fumes NFPA: Health 1, Flammability 2, Reactivity 0 Uses: Solvent for nitrocellulose, ethylcellulose, oils, dyes, gums, coatings, specialty finishes, inks, cosmetics; dipped latex prods.; diluents; adhesives; intermediates; photoresist solvents ; screen printing of electronic...
Printed Circuits Handbook, Sixth Edition > IMAGING
The equipment schematic in Fig. 26.10 illustrates the process sequence: preclean, coat, permeate rinse, rinse, and dry.22 Panels are placed in the photoresist solution wet or are often sprayed with solution to ensure wetting, especially if the parts have blind...
Planarization during spray coating: numerical study
The spray-coating system, which uses a spray nozzle transversing over a wafer while dispensing the photoresist solution , was developed to tackle the coating defect problem and limit of the current spin coating system in handling the 450 mm wafers, which will...
Photoresist coating methods for the integration of novel 3-D RF microstructures
There are only two pa- rameters, i.e., the photoresist solution viscosity and the spinning speed that strongly influence the layer forming.
Microfluidics and Microfabrication
In spray coating, the substrates proceed under a spray of pho- toresist solution .
Chemistry of photoresist recycling: II
As described in the previous SPIE report, aging at 40°C results in the generation of coagulated matter in the photoresist solution .
Fabrication of a transparent and self-assembled microlens array using hydrophilic effect and electric field pulling
After hydrophilic zones were created, the glass substrate was immersed into a diluted SU-8 photoresist solution and then removed.
Spray Coating of Photoresist for 3D Microstructures with Different Geometries
With this dilution, we can optimize the mixture of MEK to PGMEA to adjust the evaporation rate of the photoresist solution .