Products & Services
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Supplier: ULVAC Technologies, Inc.
Description: A CVD system for silicon oxide films and nitride films using SiH4 and TEOS. Can create high-quality films using high frequency (27.12 MHz). Supports single-substrate processing of substrates between 4 and 8 inches in diameter.
- Coating System Type: Cluster Tool (Multi-Chamber / Single Wafer)
- Technology / Process: Chemical Vapor Deposition (CVD)
- CVD Processes: PECVD (Plasma Enhanced)
- Applications & Materials Processed: Semiconductor Manufacturing, Decorative / Shielding, MEMS
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Supplier: Plasma Etch, Inc.
Description: This system is made for smaller production facilities, R&D facilities and universities. The system features an implosion proof 8” w x 8” d x 4” h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode. Applications include medical devices, solar cells,
- Coating System Type: Laboratory / Benchtop
- Technology / Process: Plasma Etching / Cleaning
- Applications & Materials Processed: Semiconductor Manufacturing, Photovoltaic / Solar, Medical, MEMS, Research / Surface Analysis, Other
- Materials Processed (Deposit or Substrate): Metal, Compound Semiconductors / GaAs, Tungsten / Refractory Metal, Other
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Description: Abstract Cold plasma research and development activities, as well as its applications in materials processing have grown enormously in the past decade. Cold Plasma in Materials Fabrication is a comprehensive, up-to-date monograph which presents all aspects of cold, low-pressure plasmas. The eight
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Supplier: Plasma Etch, Inc.
Description: standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.
- Coating System Type: Factory / Free Standing
- Technology / Process: Plasma Etching / Cleaning
- Applications & Materials Processed: Research / Surface Analysis, Other
- Materials Processed (Deposit or Substrate): Metal, Compound Semiconductors / GaAs, Tungsten / Refractory Metal, Other
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Supplier: 3DT LLC
Description: Do primer costs reduce your margin? Thanks to this state-of-the-art technology, this cost factor can be eliminated completely. You now have the possibility to set new standards in the processing industry. Achieve outstanding quality without time restrictions while processing, coating
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Supplier: Comdel, Inc.
Description: Accommodates up to 8 Channels and a Wide Range of Frequencies Performance: Comdel's VF8 multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF8 can accommodate up to 8 channels and may
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Supplier: Comdel, Inc.
Description: Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications Performance: The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz
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Description: . The emphasis will be on processing, measurement and phenomena, and will include vacuum processing, plasma processing, materials and structural characterization, microlithography, and the physics and chemistry of submicron and nanometer structures and devices. The journal also publishes papers from
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Supplier: Visual Sound, Inc.
Description: Fujitsu General America, Inc. Introducing the 65" AVIAMO 1080p Plasma TV from Fujitsu. This new model combines the ultimate in aesthetic elegance and refinement with today's most advanced image-enhancing capabilities. With its rich contours and stylish cosmetics designs, this display would
- Type: Plasma Display
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Supplier: MKS Instruments, Inc.
Description: for decreased processing time and increased throughput. Based on patented Low-Field-Toroidal plasma technology, the ASTRONi reactive gasgenerator provides a broader range of operating pressures while maintaining a high inputgas dissociation rate. The high reliability and field-proven design architecture
- Generator Type: Hydrogen, Nitrogen, Oxygen, Reactive / Fluorine, Specialty / Other
- Features: Portable
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Supplier: Visual Sound, Inc.
Description: Electro-Voice The Electro-Voice® Plasma P1 integrates premium EV transducers with high-power, Class-H amplification and signal processing to provide a combination of sonic detail, SPL, and ease of use. The Electro-Voice® Plasma P1 integrates premium EV transducers with high-power
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Supplier: Zak, Inc.
Description: Continuous casting, cryogenics, aerospace and food processing
- Bottom Type / Pour Method: Flat Bottom, Round Bottom
- Material Types: Copper (Water Cooled)
- Application / Industry: Chemical Processing, Nickel Base / Superalloys, Precious / Red Metals, Titanium / Reactive Metals, Other
- Furnace Type: Arc / Plasma Melting, Electron Beam Melting, Evaporator / CVD Furnace, Induction, Other
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Featured Products for Plasma Processing Processing Top
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TriStar Plastics Corp.
Plasma Surface Modification
and plastics "ultra" clean. Our vacuum plasma processes remove all residual organic contaminants, which leads to a superior bond strength - and we do it all from our in-house lab under the most-stringent processing controls. Plasma can benefit all industries …. Our clients, leaders in the medical, aerospace, and mining industries, have embraced the plasma process after realizing the many manufacturing benefits of bonding dissimilar materials. With plasma, their metal devices undergo a uniform... (read more)
Browse Surface Engineering Services Datasheets for TriStar Plastics Corp. -
TriStar Plastics Corp.
Low-pressure (vacuum) Plasma by TriStar Plastics
than manually with wet chemicals. The automated process offers better control and uniformity of the surface energy of the polymer. Plasma treatments do not alter the dimensional tolerances of a manufactured part(s), nor do they change the color or surface texture of the devices. With careful method selection and application, vacuum plasma processing can achieve a host of manufacturing benefits: Elimination of all surface contaminants. Uniform and three-dimensional treatment coverage. Minimal... (read more)
Browse Surface Engineering Services Datasheets for TriStar Plastics Corp. -
Tantec EST, Inc.
PlasmaTEC - Atmospheric Plasma Treating System
improves adhesion. Plasma technology offers innovative solutions to adhesion or wetting problems in many industries. Component preparation is an important step prior to soldering, bonding, painting, varnishing or coating processes. Plasma surface treatment provides an economical solution for the cleaning and activation of component surfaces before further processing. Tantec has developed a new and unique product - PlasmaTEC. Powered by one generator and one transformer, the PlasmaTEC generates plasma... (read more)
Browse Finishing and Surface Treatment Services Datasheets for Tantec EST, Inc. -
DeWAL Industries, Inc.
Thermal Spray / Plasma Spray Tapes
DeWAL Industries is the industry leader in the manufacture of the highest quality Thermal Spray, Plasma Spray and HVOF tapes used in the market today. Through years of development we have continued to expand our product line to incorporate glass fabric, silicone rubber metal foils and composite tape laminates to satisfy the demanding requirements of metal or ceramic plasma spraying. Our tapes are also used in grit blasting applications to reduce damage from overspray. DeWAL Thermal Spray tapes... (read more)
Browse Industrial Tapes Datasheets for DeWAL Industries, Inc. -
Hiden Analytical
Advanced Probe for Plasma Diagnostics
parameters and provide detailed information relating to plasma reaction chemistry. Plasma diagnostics for applications in etching, deposition, coating and surface modification. Hiden EQP and PSM mass/energy analysers are offered with a range of standard sampling options to provide for plasma characterisation in a broad range of applications including: ECR – Electron Cyclotron Resonance plasma is used for chemical vapour deposition, CVD and etching in semiconductor processing. Magnetic... (read more)
Browse Surface Area and Pore Size Analyzers Datasheets for Hiden Analytical -
Sulzer Metco
Sultzer Metco: Plasma Heat Treatment: IONIT®
Plasma Heat Treatment: IONIT ® from Sultzer Metco... IONIT ® is a plasma nitriding and plasma nitrocarburising techno- logy for alloyed steel, cast, sinter, and special materials. The IONIT OX ® technology combines conventional technologies such as gas nitriding/gas nitro- carburising with plasma nitriding and oxidation. A particular feature of the treated surfaces is their excellent corrosion and wear protection. . Properties and advantages. Plasma heat treatment. High... (read more)
Browse Thin Film Equipment Datasheets for Sulzer Metco -
TriStar Plastics Corp.
Atomic-level Cleaning via Surface Modification
surface for enhanced bonding. Dry and uniform, 3-D coverage – even on complex geometries. Earth-friendly process that does not release harmful solvents or alter the dimensional tolerance of components. Increased manufacturing yields and a reduction of in-field failures. Plasma cleaning by industry. Plasma processing excels in cleaning optical devices, metal aircraft and satellite components, as well as valves and bearing assemblies. In the medical arena, our plasma process promotes... (read more)
Browse Surface Engineering Services Datasheets for TriStar Plastics Corp. -
Cheap Tubes, Inc.
High Purity Multi Walled Carbon Nanotubes - MWNTs
HDPlas MWNTs 99% 13-18nm 5-30um long. Plasma purification removes all residual catalysts, amorphous carbon, and ash. The plasma processing exfoiliates the products and reduces the bundle size promoting dispersion. Available functionalities include O+ (all of the oxygen groups), COOH, NH2, N2, & Fluorine. Graphitized Nanotubes are processed at 2800C to graphitize them. This does reduce Specific Surface area by ~40%. If you are looking for small research quantities... (read more)
Browse Carbon, Graphite, and Diamond Materials Datasheets for Cheap Tubes, Inc. -
Thomas Division - Gardner Denver
Thomas Pumps & Compressors -General Applications
General. Thomas provides innovative solutions for new and evolving markets, as today's ever changing technology creates increasing demands for pressure, vacuum and flow. . Our products are widely used in a diverse range of applications including the following: Dermabrasion. De-Soldering. Evacuation. Foam Marking. Fuel Cells. Impregnation. Inkjet Printing. Photo Copiers. Photo Processing. Plasma Cutters. Spray Tanning. Tooth Whitening. Vacuum Frames. Vacuum Holding. To view... (read more)
Browse Vacuum Pumps and Vacuum Generators Datasheets for Thomas Division - Gardner Denver -
Comdel, Inc.
VF Series Multi-Channel Synthesizer Modules
Comdel's VF series multi channel synthesizer modules provide phase adjustable output to avoid destructive arcing and cross-talk in multiple cathode plasma processing chambers. The VF series can accommodate up to 16 channels and may be programmed to any frequency between 2 and 60 MHz. Frequency changes are simultaneous and phase continuous. The phase of each channel can be adjusted to an accuracy greater than 0.1 degree resolution. The VF series allows adjustment for cable length dependencies... (read more)
Browse Frequency Synthesizers Datasheets for Comdel, Inc. -
Elmet Technologies, Inc.
Molybdenum Fabricated Parts
and structures help round out the use of moly in the furnace industry. Electronic & Semiconductor Components. Silicon wafer processing relies on the use of ion implantation systems which inject ions at high energy directly into silicon wafer surfaces. The ion plasma source is energized via tungsten electrodes which operate within fabricated tungsten arc chamber. Lamp Components. The use of molybdenum in the form of leads and supports has historically been central to the success of the lighting... (read more)
Browse Materials Processing Services Datasheets for Elmet Technologies, Inc.
Conduct Research Top
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Mass and Energy Spectrometry of Processing Plasmas (.pdf)
in a wide range of. particular ions generated in the source as the sampled This can be done by incorporating the sampling orifice this meeting. Other work which includes time-. processing plasmas is of considerable assistance. neutral population is altered by changes in the plasma of the mass/energy
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Mass Spectrometry of Processing Plasmas using the EQP System
. ./745c4188-89ef-47be-9628-6866c15df0f9 Mass Spectrometry of Processing Plasmas. using the Hiden EQP System. www.HidenAnalytical.com. Plasma Diagnostic Probes. · Mass and energy analysis of ions, radicals and neutrals. · 2500 amu quadrupole option for polymer and cluster studies. · Gating input for pulsed plasma applications
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Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011
of this. order in the quadrupole mass spectrometer (QMS). These pressures are much closer to those of many processing plasmas so that the sampling of. neutral species, in particular, from the plasma is improved. The sampling of ion and neutral species from magnetron plasmas is a good example... þÿ Mass
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Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures
of this. order in the quadrupole mass spectrometer (QMS). These pressures are much closer to those of many processing plasmas so that the sampling of. neutral species, in particular, from the plasma is improved. The sampling of ion and neutral species from magnetron plasmas is a good example. The. particle
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Mass Spectroscopy of Metastable Species during Plasma Processing - GEC 2011
Among the techniques in common use for mass spectrometric studies of processing plasmas, the so-called 'threshold ionisation' (TI) method for examining the neutral species generated in a plasma has been particularly useful. In the past, the technique has been applied using source pressures
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TA002: Backside Mounting Procedures for Semiconductor Wafer Processing
as operation frequencies climb. One major challenge in expanding wafer fab capacity lies in backside processing. Historically, most GaAs backside wafer process steps have been very labor-intensive because there has not been much available in manufacturing equipment to support them. Yield has often
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Methods for Modeling Plasma System Stability
Today's modern commercial semiconductor plasma processes require, more than ever, stable and repeatable energy delivery. One of the challenges to utilizing microwaves for plasma processing is an inherent instability that sometimes renders 'repeatable energy delivery' difficult to achieve
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Atmospheric Plasma Analysis by Molecular Beam Mass Spectrometry (.pdf)
Whitmore, D.L. Seymour & I.D.Neale. Hiden Analytical Ltd., 420 Europa Boulevard, Warrington, WA5 7UN, England. Introduction. The use of atmospheric plasmas is growing in interest due to their advantage in processing materials, mainly organic, which. Fig 1. Atmospheric plasma. are not suitable for high
Engineering Web Search: Plasma Processing Processing Top
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IEEE Xplore - Plasma Science, IEEE Transactions on
Computing & Processing (Hardware/Software) Signal Processing & Analysis Transportation
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IEEE Xplore - Medical Imaging, IEEE Transactions on
Computing & Processing (Hardware/Software) Signal Processing & Analysis Transportation
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Plasma processing - Wikipedia, the free encyclopedia
Plasma processing From Wikipedia, the free encyclopedia
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Machine vision - Wikipedia, the free encyclopedia
2.2 Image processing 2.3 Outputs 3 Market
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Laboratory for Plasma Processing of Materials
Laboratory for Plasma Processing of Materials
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Plasma Processing Apparatus And Plasma Processing Method...
Abstract: A plasma processing apparatus comprising at least a plasma processing chamber for plasma-processing an object; object-holding means for
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Structure For Plasma Processing Chamber, Plasma Processing...
Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component -> Monitor
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Introduction | Nuclear Engineering and Radiological Sciences
Environmental Plasma Processing Plasma Science and Technology Laboratory Environmental Plasma Processing Introduction
