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  • MICRO: 'Round the Circuit
    Nikon Precision says it has accelerated its development plans for argon fluoride (ArF) immersion lithography. The exposure tool supplier plans to ship a mass-production-type system with a "hyper-NA" projection lens (numerical aperture (NA) of >=1.0) by the second half of 2005, a schedule
  • Projector Design Tips
    two main modules: a condenser lens system and projection lens system. The condenser lens system evenly illuminates a slide; the projector lens system projects an image of the slide onto a screen. Each module can be built with simple components and methods, beginning with the thin lens equations below
  • MICRO: Tool Fab Support
    In the last 25 years, there has been dramatic progress in the pursuit of enhanced lithographic resolution, enabling continuous improvements in IC production. These advancements have been driven by reducing the exposure wavelength and increasing the projection lens numerical aperture (NA
  • MICRO: Products
    The Model 5200 PanelPrinter system performs advanced photolithography for large-area substrate applications that require 0.8 -4- um resolution. Fully integrated subsystems include a high-fidelity projection lens and illumination system, a precision x-y stage, an automated substrate-alignment system
  • Optics Application Examples
    Although lenses are often used in imaging applications, in many cases the goal of the simple lens is the projection of light from one point to another. To be useful, emitters, detectors, lasers, and fiber optics usually require a lens for some form of light structuring. Figure A shows a typical
  • Society for Information Display New Products February 2003
    an innovative DLP Cinema head design that integrates with industry-standard lamp consoles and fits easily in any type of commercial theater projection booth. It provides SMPTE brightness on screens between 35 and 60 feet wide, and includes as standard an automated three-position lens turret system
  • MICRO: Sematech aims spotlight at breakthrough technology for spotting
    enable operators to characterize aberrations in the projection lenses for steppers and scanners. Because the tools are able to both identify the ability to image critical layers and reduce illuminator errors, one of the primary benefits is an improvement in production yields, Litel claims. One
  • MICRO: Liquid Lithography
    about defect sources. " "Defects are number one, " says Will Conley. The two International Sematech assignees are, of course, speaking about immersion lithography (IML), the technology that places water between lens and wafer, thus extending optical lithography's lifetime once again. With a lens

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