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Purge Flow Sensor

 

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Flow meters (flowmeters) and flow sensors are devices used for measuring the flow rate or quantity of a moving fluid or gas.
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Parts by Number for Purge Flow Sensor Top

Partb # Distributor Manufacturer Product Category Description
1350EGC4CJA1A PLC Radwell Brooks Instrument Sensors & Switches, Flow Meter PURGE METER 1/4IN NPT
1355EG2BJ1U1A PLC Radwell Brooks Instrument Sensors & Switches, Flow Meter FLOWMETER PURGE SHO-RATE 150MM TUBE 200PSIG@250F

Conduct Research Top

  • New Gas Sensors Simplify Power Plant Leak Detection
    of. placing the sensor remote from the transmitter, or. 1.0) minimizes windage losses, as long as purity is. drawing a sample from a remote or inaccessible. maintained above 90%. location. The latter includes a flow switch to indicate. sample system integrity. A calibration adapter is. Analytical
  • Measurement and Control of Compressed Air Systems (.pdf)
    the output of an air dryer after. a particulate filter. Correct positioning of flow and pressure regulation will. facilitate measurement at either line pressure or atmospheric pressure. A. suitably ranged flowmeter after the sensor provides an on-going indication. that an adequate flow rate is achieved
  • MICRO: Product Extra
    The rapid atomic layer deposition (RAD) process module from Genus boosts ALD deposition rates to ~100 A/min, more than five times that of conventional ALD . The new ALD chamber on the StrataGem platform reduces precursor exposure time at the wafer surface and uses purge steps as short as 0.2
  • MICRO:Process Equipment Furnaces by Mark Yelverton, p.27 (April '99)
    stack at AMD's Fab 15. One method for in situ MFC calibration uses a mass-flow meter (MFM) in a common nitrogen purge line to all MFCs, as shown in Figure 2. Valves A and C are used to flow nitrogen gas through the MFM and the first MFC. The proper use of interlocks, gas pressure, and check valves
  • MICRO:April 98:Product Technology News
    the quality of back-purge gas during the welding of stainless-steel, chrome-molybdenum, titanium, and nickel alloys. The purge monitor's sensor has a 36-month lifetime, and the instrument's temperature compensation circuitry keeps the unit in calibration at all times. The monitor's range is 20.9%
  • MICRO:Top 40 - Page 2 (Nov '00)
    an object-oriented, multitasking Windows NT software platform that facilitates factory integration. ADP/ADS Series Two semiconductor process pumps are based on multistage Roots technology. The dry pumps feature a nitrogen mass-flow sensor and standby purge function, and they provide precise temperature control
  • MICRO: Product Technology News (February 2001)
    , suppressor module, and conductivity detector in one compact unit. Each IC has a flow path that is constructed of PEEK. The pump provides variable flow levels from 0.2 to 2.5 mL/min, while the detector has selectable thermostat temperatures from 25 to 45 C in 5 C steps. Peripherals are kept
  • MICRO: Product Technology News (April 2001)
    focus-exposure. A high-flow maglev turbopump has a small design for semiconductor processes. The ATH1600 provides reliable vacuum performance. The pump is suitable for metal etch, dielectric etch, interconnect etch, ion implantation, sputtering, and plasma-enhanced chemical vapor deposition

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