TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF-V310 can measure elements from Na through U with a single-target, 3-beam X-ray
system and a solid-state detector
system. The TXRF-V310 includes Rigaku's patented XY θ sample stage
system, an in-vacuum wafer robotic transfer
system, and new user-friendly windows software. All of these contribute to higher throughput, higher accuracy and precision, and easy routine...
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