Products & Services

See also: Categories | Featured Products | Technical Articles | More Information
Page: 1

Conduct Research Top

  • MICRO: Thermal Processing
    material must be optimized. An excessively rapid thermal treatment can cause the polymerization of the surface and prevent adequate moisture or solvent evaporation from the bulk of the SOD. Outgassing can cause trapping of hot and volatile compounds under the fully polymerized SOD surface layer
  • Characterizing a rapid thermal annealing process to improve sensor yield
    in the production of acceleration sensors, surface micromachining requires the integration of traditional semiconductor processing with a sound, thorough understanding of material properties and mechanics. Basically, these silicon-based precision sensors convert a raw physical input signal
  • MICRO: Industry News: 'Round the Circuit (September 2000)
    009;A calibration wafer developed by NIST improves chipmakers' ability to accurately measure and control temperature during rapid thermal processing (RTP). The test wafer is designed to meet the semiconductor industry's need to reduce temperature measurement uncertainty to 2 C. Thin-film
  • MICRO: Prod Tech News
    Helios, a rapid thermal processing (RTP) system, allows chipmakers to address demanding 300-mm RTP applications down to the 65-nm node, including ultrashallow junction (USJ) and nickel silicide formation. As the industry moves to short anneal cycles in advanced devices, precision thermal control
  • MICRO: Ultraure Gases - McAndrew (Feb 2000)
    the increasingly stringent requirements of contamination control in the production of devices with small design rules and promotes a lower cost of ownership. The application of TDLAS to rapid thermal processing, where the only process gas is nitrogen at atmospheric pressure, has been described elsewhere. Based
  • MICRO:Archive:Back Issue TOC
    slurry cleaning systems, particle detection system, silicon-on-quartz wafers, yield management software, linear motion guide, flame detector, brushless linear motors, Teflon bellows, rapid thermal processing tool, poly etch system, critical dimension SEMs, flow switches, web-enabled tool connectivity
  • MICRO: TechEmergent
    implantation processes to achieve ultrashallow ( <500- A) implantation depths. Several types of annealing methods, including rapid thermal-spike anneals, laser annealing, and flash-lamp annealing, are known to minimize the diffusion of dopants, thus forming low-resistivity ultrashallow junctions (USJs
  • MICRO: Building Copperopolis II - Yang (May 2000)
    Feng Yang and William A. McGahan, and Carol E. Mohler and Lisa M. Booms, Because controlling curing temperature and time is critical for producing high-quality spin-on dielectric thin films, rapid feedback from metrology tests on thermal process tools is needed to correct tool drift . As device

More Information Top

Lock Indicates content that may require registration and/or purchase. Powered by IHS Goldfire