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Parts by Number Top

Part # Distributor Manufacturer Product Category Description
RCA122 AmericanMicroSemi AMS Transistors:Darlington Transistors:NPN rca122 rca122 pdf rca122 datasheetrca122 is on sale at our online store for 25.3. Call 973-377-9566 100% Satisfaction Gauranteed. American Microsemiconductor Inc.FREE UPS ground shipping or more. Also get special discount on International orders. AM
RCA112011 AmericanMicroSemi AMS Other:Alphanumerical Listing:R RCA112011 RCA112011 pdf RCA112011 datasheetRCA112011 is on sale at our online store for 3.29. Call 973-377-9566 100% Satisfaction Gauranteed. American Microsemiconductor Inc.FREE UPS ground shipping or more. Also get special discount on Internationa
RCA423 AmericanMicroSemi AMS Solid-State: RCA423 RCA423 pdf RCA423 datasheet NTE RCA423 RCA423 11.330 American Microsemiconductor RCA423 available at 11.330. FREE UPS ground shipping or more.
RCA ASAP Semiconductor RCA Not Provided Not Provided
RCA ASAP Semiconductor OSEL Not Provided Not Provided
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Conduct Research Top

  • Characterizing organic impurities in semiconductor-grade hydrogen peroxide
    is the process chemical most commonly used in wet cleaning systems, the most prevalent cleaning method, the hydrogen peroxide based RCA standard clean, will continue to be the state of the art. While there is much information about the impact of cationic impurities on yield, little is known about the effect
  • MICRO: Ultrapure Fluids - Winters (April 2000)
    in the cleaning sequence. The fact that the RCA cleaning sequence, improved with the introduction of megasonics and dilute chemistry, is still in use in front-end processing after 30 years implies that it adheres to these cleaning parameters. The peroxide-based RCA technique uses two standard clean
  • MICRO: Wet Surface Technology
    and surface haze from silicon wafer substrates. The experiments were conducted at M/A-Com (Burlington, MA), which manufactures radio-frequency (RF) microwave devices using silicon and gallium arsenide processes. The chemistry in question was ultradilute RCA-SC-1 followed by RCA-SC-2
  • MICRO: News lead
    and contractions at industrial R &D organizations such as Bell Labs and RCA Laboratories have left more research to universities, which have less expertise in commercializing generally usable ideas. Rick Hazard, president
  • MICRO: Green Manufacturing
    . To lower chemical consumption and disposal costs as well as to improve cleaning efficiency, ozone has been studied during the past decade as an alternative to traditional sulfuric acid -peroxide and RCA cleans using basic (SC-1) and acidic (SC-2) hydrogen peroxide mixtures. It is effective because
  • MICRO: Vereecke
    are preferable for cost and environmental reasons. Seeking a cost-efficient and ecologically sound cleaning method, scientists at RCA in the 1970s thought that by adding the physical action of ultrasound waves to a cleaning solution, they could reduce
  • Evaluating reusable HDPE containers for delivery of high-purity hydrofluoric acid
    for chemicals used in such critical cleaning operations as the RCA process and processes using solutions of hydrofluoric acid. Metallic impurities can adversely affect oxide integrity, reduce minority carrier lifetimes, provide nucleation sites for stacking faults during film growth, and cause surface

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