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  • Outgassing Species in Optoelectronic Packages
    accepted method for evaluating internal gas content is Residual Gas Analysis (RGA) via mass spectrometry.
  • Interpretation of RGA Data
    Residual Gas Analysis of hermetic microelectronic devices has traditionally been treated as a means of measuring a device's internal moisture content only. Too many times, the moisture reading is treated on a pass/fail basis using the MIL/STD criteria that all devices must contain less than 5,000
  • MICRO:April 98:Product Technology News
    at millitorr pressure. On-line process monitoring, control, purity verification, and residual gas analysis can be performed in real time using a Windows-based program. Mass range is 3/4300 amu. The analyzers are programmable and also feature multiple-head operation. The FPA-3000EX5 resolves 0.22- um features
  • PAT Advances Freeze Dryer Control
    Gas Composition Provides Process Clues PAT techniques based on real-time analysis of lyophilizer gas composition also are being developed, Trappler says. Currently, the two most useful appear to be residual gas analysis (RGA) based on mass spectrometry and infrared (IR) spectrometry. There are some
  • STEM System
    in the millisecond range. The unit offers high particle-removal efficiency with low film loss at the 65-nm node and beyond. TOOLweb RGA, a sensor automation platform for residual gas analysis (RGA) control and communication, monitors process integrity and tool performance in real time, identifying process excursions
  • MICRO: Taking Control
    -copper metal deposition chambers, a preclean chamber, and two degas chambers. Each of these chambers had active residual gas analysis (RGA) sensors, and the preclean chamber also had a particle monitor. After performing a series of wafer runs to characterize the system, the engineers had a picture
  • MICRO: Critical Materials Analysis
    or residual compounds from prior processes, and reactive flows, in which high-purity gases are used for chemical incorporation in film growth. Typically, point-of-use purification systems are used in conjunction with high-purity gas supplies to ensure that water is not introduced into the process stream
  • MICRO:Analysis and Metrology (Jan '99)
    device is $100 and there are 250 devices per wafer, the scrap produced in 23 minutes affects approximately $190,000 of gross revenue. One useful instrument for monitoring process gas purity is the partial-pressure gas analyzer (PPA), also known as a residual gas analyzer (RGA). A PPA reports

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