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  • MICRO: Process Tool Support
    semiconductor manufacturing processes, some of which are also used in the manufacture of disk media and flat-panel displays. Processes that deposit thin films, such as sputtering and CVD, and processes that remove thin films, such as plasma etching and CMP, are especially prone to contamination from process
  • Product Extra!
    An alternative to traditional PVD technologies, the Inova system combines a hollow cathode magnetron source and a high-productivity platform to uniformly deposit sputtered metal films. The source offers directional deposition unaffected by feature width. The system's cup-shaped target

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