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Semiconductor Pad

 

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Thermal compounds and thermal interface materials form a thermally conductive layer on a substrate, between components or within a finished product.
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Parts by Number for Semiconductor Pad Top

Partb # Distributor Manufacturer Product Category Description
PAD1 ASAP Semiconductor MOTOROLA Not Provided Not Provided
PAD20 ASAP Semiconductor CALOGIC Not Provided Not Provided
PAD1 ASAP Semiconductor SILICONIX Not Provided Not Provided
PAD2 ASAP Semiconductor PHILIPS Not Provided Not Provided
PAD1 ASAP Semiconductor VISHAY Not Provided Not Provided
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Conduct Research Top

  • Plastic pads give silicon wafers TLC
    Piper Plastics Inc., Chandler, Ariz., wanted to injection mold end-effector pads for use in semiconductor manufacturing. Though exposed to organic chemicals and high temperatures, end-effector pads molded from Victrex T-Series polymers retain their properties. The proprietary PEEK/PBI blend
  • Semiconductor Equipment Makers Look for Stability
    or lowers modules when they need to turn corners or exit onto a different conveyor. The belts are specially made to ensure they shed as few particulates as possible. The whole apparatus is a. Semiconductor Equipment Makers Look for Stability | Ball screw-driven (eCKK) | Belt-driven (eCKR) | Machine
  • Tico Mounting Pads take the pressure
    . Renewable Energy. Semiconductor & Electronics. Water & Waste. Wind energy. Products & Services. Care of the environment. Energy efficiency. EU IPPC directive. Fugitive emission control. Noise & vibration reduction. Renewable energy. Compression Packings. For Valve Stems. For Centrifugal Pumps/Rotary
  • TA002: Backside Mounting Procedures for Semiconductor Wafer Processing
    . ed inside the vias to prevent solder from. need to be either sprayed. "wicking up" and "blowing out" the front-. onto the backside wafer. side metal pads.30 If the die are to be. surfaces or heated and agi-. attached using a conductive epoxy, then a. tated. However, the wet. solder stop layer
  • MICRO: Characterizing CMP
    A case study investigates how conditioning CMP pads with different diamond abrasives affects film removal rates, wafer-to-wafer nonuniformity, wafer defects, and pad lifetime. hemical-mechanical polishing (CMP) has enabled the production of advanced semiconductor devices by producing a globally
  • Voiding Control for QFN Assembly
    (15). reflow profile (3). Reliability (4). response to pause (1). Rework (3). rheology (1). RoHS (3). room temperature bonding (1). SAC (6). SAC105Ti (1). SAC305 (1). selective soldering (1). selective wave soldering (1). semiconductor assembly (1). semiconductor packaging (2). separation speed (1
  • MICRO:Building Copperopolis, by Hugh Li, p.35 (March '99)
    the semiconductor manufacturing and equipment industries. Copper is significantly less resistant than alumi-num, the most widely used interconnect material, and this attribute reduces the resistance-capacitance delay that becomes significant at 0.18-um and smaller linewidths. However, if copper
  • " chemical-mechanical polishing (CMP) pads? What about the role of supercritical CO2 (scCO2) in a variety of IC processes? Or the possibility of reducing waste in the semiconductor industry? These topics and more were the subject of a two-day conference organized in this desert city to grapple

Engineering Web Search: Semiconductor Pad Top