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  • Central Air Abatement System (CAAS) Scrubbing in Semiconductor Manufacturing (.pdf)
    A number of sources in the semiconductor manufacturing process produce diluted levels of acid gases, silanes, ammonia and some organics. The most common gases are hydrochloric acid (HCl), hydrofluoric acid (HF), hydrobromic acid (HBr), phosphoric acid (H3PO4), nitric acid (HNO3) and ammonia (NH3).
  • MICRO: World Beat
    009;Praxair's joint venture in Taiwan has opened the country's first transfill plant for silane. The plant is operated by Praxair Chemax Semiconductor Materials, a partnership between the Connecticut-based industrial gases manufacturer and China Petrochemical Development of Taiwan. The automated
    for incoming material. The company reported no injuries. The area contained "a small number of nontoxic, pure silane gas cylinders, " according to the vendor. Electrical power and gas that were shut down during the fire were restarted by late afternoon, August 25. Lost silane inventory was replaced
  • MICRO: Ultrapure Gas Delivery - Gotlinsky (July 2000)
    Barry Gotlinsky and Joseph O'Sullivan, ; and Motonobu Horikoshi and Shinichi Babasaki, Parts-per-trillion-level purification of process gases can be obtained with a new purification technology and confirmed through APIMS measurements. Silane and other process gases used for thin-film formation
    Single component room temperature vulcanizing ('RTV') silicones are widely used as sealants and adhesives in the fabrication of many products; including medical devices. For 'acid cure' systems, exposure of the material to atmospheric moisture initiates a catalyzed reaction of the acetoxy silane
  • Computer Power User Article - Under Development
    of mechanical engineering, sought a way to keep the temperature extremely localized. They coated a 1cm-square silicon wafer in either a gold-palladium alloy to make silicon nanowires or a nickel-iron alloy to make carbon nanotubes. Either silane or acetylene vapors, respectively, were directed
  • Recent Case Studies Highlights
    Linearly-Scalable to Thousands of Atoms Studies of Catalytic Oxide Supports - Comparative Behavior of Pd and Ag Deposition on Clean a-Al2O3 (001) Surfaces Simulations of Glass Surfaces: Developing an Understanding of Silane Binding A New Solvation Model for Polymers and Surfaces - Accurate Prediction
  • MICRO: Archive: 2002 Back Issues
    of foundry's single-wafer technology; TEL debuts plasma tool Praxair opens Taiwan silane site; Chartered, IMEC offer SiGe; Veeco opens Beijing center Adopting e-manufacturing in the semiconductor industry Improving equipment productivity through on-product etch-process monitoring Reducing water consumption

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