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  • MICRO: E A & A
    KLA-Tencor and Soitec have joined forces to develop the first wafer-inspection system optimized for silicon-on-insulator (SOI) applications in the 90- and 65-nm nodes. The tool will be based on KLA-T's Surfscan SP1 platform, with the initial system shipping to Soitec's Bernin, France, site in early
  • MICRO: Product Technology News (September 2000)
    comparable to that of pumps for 200-mm processes. They offer high pumping speeds, quiet operation, ease of control, and low cost of ownership for the difficult etch, PECVD, and LPCVD processes used in silicon wafer and flat-panel display manufacturing. Two systems added to the NSX series perform
  • MICRO: Products
    The Reflex Auto system can detect defects as small as 90 nm on 50 -200-mm wafers. The tool, which is distributed in the United States by Hologenix, consists of a defect-inspection module, a robot with an integrated notch/flat aligner, and an open cassette. Customized versions are also offered
  • MICRO: Products
    The WM-5000 unpatterned-wafer inspection system for 0.07- um design rules uses a 400-nm-wavelength laser light source (a violet laser diode). Distributed by Macrotron Process Technologies in Europe, the tool achieves very high detection sensitivity down to 0.041 um. The system can inspect 100
  • MICRO:
    and students. the 40 most popular products of 2000, including wafer shipping boxes, transport robots, lithography tools, copper-cleaning products, mass-flow controllers, wafer dryers, copper-stripping systems, and an array of valves, regulators, sensors, pumps, and detectors. Silicon Valley plugs
  • MICRO: 2001 Back Issues
    Wider 'Net-based tool diagnosis is becoming a remote possibility Applied enters yet another market segment with introduction of Swift implantation tool New head of silicon house foresees 5�19% rise in wafer reclaim prices IBM drops $5B bombshell; Pentagon opens parts cleaning plant; Cymer
  • MICRO: Product Tech News
    To accelerate transistor innovation at the 65- and 45-nm nodes, the eS32 E-beam inspection tool captures subtle electrical defects and small physical ones. The system offers features that accelerate the detection and resolution of systematic, yield-limiting defects in both front-end and back-end
  • MICRO:Archive:Back Issue TOC
    slurry cleaning systems, particle detection system, silicon-on-quartz wafers, yield management software, linear motion guide, flame detector, brushless linear motors, Teflon bellows, rapid thermal processing tool, poly etch system, critical dimension SEMs, flow switches, web-enabled tool connectivity

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