and repeatable power control, ultra-stable output and low cost of ownership. The CLB Series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel
plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and
solar photovoltaic applications. Specifications: Frequency: Any single frequency from 20kHz to 2MHz, varying +/-10%. Line frequency: 50/60 Hz. Analog...
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