Products & Services
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Supplier: PLANSEE SE
Description: Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. Wherever large screen layouts, particularly high image definition and optimized contrasts are needed, tungsten layers are the optimal choice. Tungsten sputtering targets from PLANSEE are maximal dense, highly pure
- Type: Sputtering Target
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Supplier: PLANSEE SE
Description: Molybdenum-tungsten alloys (MoW) offer enhanced stability against ITO, aluminum or copper etching solutions. . Thanks to the powdermetalurgical production process, the targets show an uniform tungsten distribution. With molybdneum-tungsten targets you can selectively slow down the speed of etching.
- Type: Sputtering Target
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Supplier: PLANSEE SE
Description: Tungsten and molybdenum are used as thin films for TFT displays. PLANSEE supplies sputtering Targets the CIGS, CdTE and CSP technologies in the solar industry. The targets show an optimized microstructure, best density and resistance against oxidation and corrosion. Benefits are higher sputtering
- Type: Sputtering Target
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Description: or thermocouples. Sputtering target plates are manufactured from Tungsten Silicide powders typically by hotpressing, isostatic pressing or plasma spark sintering.
- Shape / Form: Powder
- Features: Powdered Metal (Compacted)
- Applications: Electronics / RF-Microwave, Other
- Metal / Alloy Types: Refractory / Reactive (UNS R), Tungsten / Tungsten Alloy
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Description: Hexoloy® SiC, the world’s most popular alternative to tungsten carbide, provides long life due to excellent wear, corrosion and abrasion resistance. Hexoloy SiC, abrasion resistant materials, are used extensively in demanding nozzle applications in which abrasion is a concern. The use
- Type: Sputtering Target
- Materials Processed: Specialty / Other
- Applications: Other
- Applications & Features: Conductive, Transparent
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Thin Film Materials
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Featured Products for Tungsten Sputtering Target Top
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Elmet Technologies, Inc.
Molybdenum and Tungsten Sputtering Targets
Elmet has been providing Molybdenum and Tungsten sputtering targets to numerous industries for many applications for decades. Our high quality targets are used in many of the most challenging industries including Flat Panel Display (FPD), semiconductor (memory and logic), and Thin-Film Photovoltaic (TFPV). Our vertically integrated process is designed to ensure the highest quality materials are delivered to our customers. . Innovation. As requirements for each industry have changed, Elmet... (read more)
Browse Metal Powders (Powdered Metals) Datasheets for Elmet Technologies, Inc. -
Elmet Technologies, Inc.
CUSTOM Molybdenum and Tungsten Sputtering Targets
Elmet has been providing Molybdenum and Tungsten sputtering targets to numerous industries for many applications for decades. Our high quality targets are used in many of the most challenging industries including Flat Panel Display (FPD), semiconductor (memory and logic), and Thin-Film Photovoltaic (TFPV). Our vertically integrated process is designed to ensure the highest quality materials are delivered to our customers. Innovating. As requirements for each industry has changed, Elmet has... (read more)
Browse Thin Film Materials Datasheets for Elmet Technologies, Inc. -
H.C. Starck Inc. - Fabricated Products Group
Molybdenum Sputtering Targets for Photovoltaic
characteristics. Customers benefit from inhouse prototyping, modeling and analytical capabilities. Highest Quality Sputtering Target Materials. H.C. Starck is one of the world ’s largest producers of molybdenum, tungsten, tantalum and niobium metals, and fabricated products with a robust vertically integrated supply chain for supplying sputter targets for thin film coatings applications. Manufacturing facilities produce a broad range of sputtering target materials in all configurations. ... (read more)
Browse Molybdenum and Molybdenum Alloys Datasheets for H.C. Starck Inc. - Fabricated Products Group -
H.C. Starck Inc. - Fabricated Products Group
Molybdenum Sputtering Targets - Flat Panel Display
processing and evaluation of thin films. Our facilities include a Thin Film Materials Lab equipped with planar and rotary sputtering tools along with the supporting equipment for film characterization. Customers benefit from in-house prototyping, modeling and analytical capabilities. To assure quality in sputtering targets, Electron Back Scatter Diffraction [EBSD] analysis is. Highest Quality Sputtering Target Materials. H.C. Starck is one of the world ’s largest producers of molybdenum, tungsten... (read more)
Browse Molybdenum and Molybdenum Alloys Datasheets for H.C. Starck Inc. - Fabricated Products Group -
Elmet Technologies, Inc.
Machined Components for Semiconductor/Electronics
semiconductor and electronics market. Elmet ’s product solutions support power semiconductors, crystal growth, and thermal management technologies. Process Tooling. Providing precision machined components for OEMs and the aftermarket for tooling including ion implantation, MOCVD, PVD, and MBE. Process Materials. Planar and rotary sputtering materials and targets. Power Semiconductors. Molybdenum components for high power diodes and thyristors. Thermal Management. Providing tungsten... (read more)
Browse Materials Processing Services Datasheets for Elmet Technologies, Inc.
Conduct Research Top
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A Room Temperature, Low-Stress Bonding Process to Reduce the Impact of Use Stress on a Sputtering Target Assembly (.pdf)
. A Room Temperature Low Stress Bonding Process for Sputtering Target Assembly Indium Corporation Tech Paper. A Room Temperature, Low-Stress Bonding. Process to Reduce the Impact of Use Stress. on a Sputtering Target Assembly. Authored by: Amanda Hartnett, Jacques Matteau, Ronnie Spraker
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Hot Isostatic Pressing: Today and Tomorrow (.pdf)
rough machined, sintered, HIPped. and final machined. Post HIP can be applied to a variety of powders, but. may be best suited for materials with higher melting points such as car-. bides and ceramics. Sputtering Targets. Targets are made from high-purity metal and. ceramic powders, and are used in thin
Engineering Web Search: Tungsten Sputtering Target Top
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tungsten sputtering target - offers from tungsten sputtering...
tungsten sputtering target manufacturers, exporters, suppliers, factories and distributors related to tungsten sputtering target
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Sell Sputtering Target
Our company produces various kinds of Metal target materials and Alloy target materials by smelting and powder metallurgy, we can provide customer
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Tungsten Sputtering Target W | AMERICAN ELEMENTS ®...
Tungsten Sputtering Target High Purity W Sputtering Target CAS 7440-33-7 (2N) 99% Tungsten Metal Sputtering Target
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Lithium Sputtering Target Li | AMERICAN ELEMENTS ®...
Lithium Sputtering Target High Purity Li Sputtering Target CAS 7439-93-2 (2N) 99% Lithium Sputtering Target LI-M-02-ST
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ASTM F1238 - 95(2011) Standard Specification for Refractory...
ASTM F1238 - 95(2011) Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
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Alibaba Manufacturer Directory - Suppliers, Manufacturers,...
home products tungsten sputtering target tungsten sputtering target ( 1 Products)
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AlSi alloy Sputtering Target/ ZnSn alloy Sputtering Target -...
Sputtering Targets Materials list: Metal sputtering target: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium
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Cerametek Materials: semiconductor compounds, (5N-6N), Rare...
quartz, fused oxides/SiC. - Vapor deposition and Sputtering materials: 2N-4N, Metal oxide, Metal, Rare earth metals, Compounds of semiconductor and
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Sputter yield amplification by tungsten doping of Al2O 3...
Sputter yield amplification by tungsten doping of Al2O 3 employing reactive serial co-sputtering: Process characteristics and resulting film
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Microelectromechanical systems - Wikipedia, the free...
2.3.2.2.1 Sputtering 2.3.2.2.2 Reactive ion etching (RIE)
