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Supplier: Park Systems, Inc.
Description: The XE-WAFER is a fully automated industrial AFM designed specifically to address surface roughness, trench width, depth, and angle measurements on 200mm & 300mm wafers in a production environment. The system provides superior accuracy and precision nanometrology over any other system
- Application: Semiconductor Inspection
- Scanning Probe Microscope Type: AFM
- Grade: Benchtop
- Microscope Type: Scanning Probe / Atomic Force (SPM / AFM)
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Supplier: Hiden Analytical
Description: The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia.
- Form Factor: Controller, Wafer Probing System
- Mounting / Loading: In-situ / System Mounted
- Applications: Etching - Plasma / Wet, Other
- Measurement Capability: Deposition Rate
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Supplier: MTI Instruments Inc.
Description: The Proforma 300 is completely menu-driven. The on-board intelligence provides fast, accurate, repeatable measurements for all types of wafer materials. Maximum measurement range or maximum probe/wafer stand-off distance can also be adjusted to meet your specific requirements. Features
- Form Factor: Wafer Probing System, Sensor / Sensing Element
- Mounting / Loading: Manual Loading
- Applications: Semiconductor Wafers
- Measurement Capability: Roughness / Waviness, Shape / Flatness, Thickness - Wafer / Disc (TTV)
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Supplier: REOTEMP Instruments Corporation
Description: Metal sheathed assembly, single or dual element, wafer head attached
- Base, Noble and Refractory Metal Type: E, J, K, T
- Configuration: Grounded Thermocouple, Ungrounded Thermocouple
- Element Configuration: Single Element, Double Element
- Probe Configuration: Straight Probe
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Supplier: Precitec, Inc.
Description: with just one measuring point and can measure a wafer precisely to a thickness of 1 mm. The background to this new, non-destructive measuring process is a sensor that works with interferometry, using infrared light and not, as is usual, white light. Advantage: One measuring point with very bright
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Supplier: Electronic Development Labs, Inc. (EDL)
Description: Film wafer surface sensor, used for laminators, approximately .002" thick
- Sensor Type: Temperature Probe
- Thermocouple Type: J (-210°C - 1200°C)
- Configuration: Grounded Thermocouple
- Element Configuration: Single Element
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Supplier: KLA-Tencor Corporation
Description: Therma-Probe is the industry standard for implant dose metrology. With its advances in modulated optical reflectance, Therma-Probe provides dose measurements for in-line monitoring, including anneal and USJ profiling. The system contributes to higher yield by monitoring for process excursions
- Form Factor: Wafer Probing System
- Mounting / Loading: Autoloading / In-line, Floor Mounted / Stand-alone
- Applications: Semiconductor Wafers
- Measurement Capability: Other
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Supplier: Cascade Microtech, Inc.
Description: Designed specifically for DC/CV parametric measurement applications
- Form Factor: Wafer Probing System
- Mounting / Loading: Manual Loading, Other
- Applications: Semiconductor Wafers
- Measurement Capability: Electrical Test - Parametric / In-line
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Supplier: MTI Instruments Inc.
Description: Using MTII’s exclusive Push/Pull capacitance probe technology, each PV-1000 module provides up to three pairs of probes for measurement of maximum, minimum and average thickness, as well as total thickness variation (TTV) and wafer bow. For applications requiring additional thickness channels
- Form Factor: Controller, Sensor / Sensing Element
- Mounting / Loading: In-line, Floor Mounted / Stand-alone, Manual Loading
- Applications: Etching - Plasma / Wet
- Measurement Capability: Deposition Rate, Dopant Level / Resistivity, Endpoint Detection / Plasma Diagnostics, Roughness / Waviness, Shape / Flatness, Structure / Residual Stress, Thickness - Film / Layer, Thickness - Wafer / Disc (TTV)
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Supplier: OMICRON NanoTechnology
Description: 1"-4" wafer sample, 3-D tip coarse positioning
- Application: Biological / Life Science
- Grade: Research
- Microscope Type: Scanning Probe / Atomic Force (SPM / AFM)
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Supplier: Bruker Nano Surfaces Division
Description: The Innova atomic force microscope provides more performance and flexibility at a greater value than any other SPM. The proprietary closed-loop scan delivers noise-levels that approach those of high-end, open-loop systems and offers a wide range of functionality for physical, materials, and life
- Form Factor: Monitor / Instrument
- Mounting / Loading: Manual Loading
- Applications: Semiconductor Wafers
- Measurement Capability: Roughness / Waviness
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Supplier: Skyworks Solutions, Inc.
Description: technology offers improved power handling capability in comparison to the traditional thick film printed attenuator. All ATN3580 attenuator chips are specified for their attenuation at DC. In addition, a wafer probe sample test is performed to 40 GHz to assure meeting the flatness specification. Skyworks'
- Attenuator Type: Fixed
- Package Type: Flat Pack (FPAK)
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Supplier: Precitec, Inc.
Description: CHRocodile IT TW Application: Non-contact thickness measurement of Thin Wafer High measuring rate nm resolution Transparent coatings/foils from 3.5 up to 250 µm
Find Suppliers by Category Top
Featured Products for Wafer Probe Top
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MTI Instruments Inc.
Semiconductor Wafer Thickness Gage
to Set Up, the Proforma 300 provides the user precise non-contact measurements at critical points throughout the wafer manufacturing process. Thickness and TTV values are obtained by placing the wafer between MTI Instruments' non-contact capacitance probes. The Teflon coated wafer stage allows for easy, non-abrasive positioning of the wafer, while removable locating pins can be utilized for precise center thickness measurements. Thickness and TTV values are indicated on the high resolution LCD... (read more)
Browse Semiconductor Metrology Instruments Datasheets for MTI Instruments Inc. -
MTI Instruments Inc.
Wafer Metrology Measurement Tool
The Proforma 300SA is a semi-automated thickness measurement system for both semiconducting and semi-insulating wafer materials. Capable of handling 150mm, 200 mm and 300mm wafers, the 300SA provides highly accurate, repeatable measurements of thickness, TTV, bow, warp, site and global flatness. Built around MTI Instruments' exclusive Push-Pull capacitance technology, the Proforma 300SA delivers full wafer surface scanning at the press of a button. User defined and ASTM/SEMI scan patterns... (read more)
Browse Wafer and Thin Film Instrumentation Datasheets for MTI Instruments Inc. -
MTI Instruments Inc.
Wafer Measurement System from MTI Instruments
Semi-Automated Wafer Measurement System for Semiconducting and Semi-Insulating Material. The ProformaTM 200SA is a semi-automated thickness measurement system for both semiconducting and semi-insulating wafer materials. Capable of handling 75 to 200 mm. wafers, the 200SA provides highly accurate, repeatable measurements of thickness, TTV, bow, warp, site and global flatness. Built around MTI Instruments' exclusive Push-Pull capacitance technology, the Proforma 200SA delivers full wafer surface... (read more)
Browse Wafer and Thin Film Instrumentation Datasheets for MTI Instruments Inc. -
Anritsu Company
VectorStar Broadband VNA ME7838A
measurement speed: 55 ms vs 500 ms for 201 pts. Industry-best calibration and measurement stability: 0.1 dB vs 0.6 dB over 24 hrs. Compact, lightweight mmWave modules for easy, precise, and economical positioning on the wafer probe station - 0.6 vs 7.6 lb and 1/50 the volume. Fully compatible with millimeter-wave/terahertz frequency-extension modules from leading suppliers... (read more)
Browse Vector Network Analyzers Datasheets for Anritsu Company -
MTI Instruments Inc.
Solar Wafer Thickness Tool from MTI
and production environments, the PV-1000 solar wafer measurement module fits anywhere on the production line. Its modular design offers expandability to meet your current and future measurement requirements. The PV-1000 Advantage. Using MTII's exclusive Push/Pull capacitance probe technology, each PV-1000 module provides up to three pairs of probes for measurement of maximum, minimum and average thickness, as well as total thickness variation (TTV) and wafer bow. For applications requiring... (read more)
Browse Semiconductor Metrology Instruments Datasheets for MTI Instruments Inc.
Conduct Research Top
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Evaluating pHEMT Process Improvements Using Wafer Level RF Tests
to the wafer fab process engineer. Adding wafer level RF tests provides quicker feedback. and reduces the time required to complete a cycle of. learning. This paper discusses the RF wafer probe tests. used to evaluate the continuous improvements in. Skyworks' pHEMT wafer process. Microsoft Word
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Discussion on Probe Tip and Device Temperatures when Operating the VectorStar ME7838A Broadband System Application Note
The VectorStar ME7838A Broadband system operates from 70 kHz to 110 (125) GHz utilizing the small, compact 3743x mmWave module. The ME7838A system offers on-wafer device characterization with significantly improved performance and convenient installation. With the advent of the new ME7838A has come
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RF Test Gage R&R Improvement
to the. Gage study passed. Further, the percentage of die. operator. This result was marginal at 13.5%. requiring re-test was reduced significantly. Figure 1. INTRODUCTION. Third Harmonic Gage R&R Results. Wafer Probe 3rd Harmonic Gauge R & R. State of the art multi-throw RF switches need to meet. third
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Non-Contact Thickness Measurement of Semiconductor Wafers
removal rates are within customer specifications. The thickness measurement device must not only be capable of producing a highly accurate reading, it must do so without contacting the wafer surface. Capacitance based measurement probes have long been employed as a means of non-contact measurement
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Thickness, Shape and Flatness Measurement of Semiconductor Wafers
of point measurements. TTV is expressed in microns or mils (thousandths of an inch). Figure 1. Figure 1 above shows a wafer placed between two non-contact measurement probes. By monitoring changes between the upper probe face and the upper wafer surface (A) and the bottom probe face and the bottom
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Rapid Deployment OEM Sensor for High Precision Measurement Applications
manufactures manual, semi-automated and fully automated wafer characterization tools designed to measure wafer thickness, total thickness variation (TTV), bow, warp and flatness of semi-insulating and semiconducting materials. MTII’s Aviation Balancing Instruments group provides state-of-the-art portable
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Fast Response Optical Sensors Prove Invaluable in Demanding Gaging Applications
manufactures manual, semi-automated and fully automated wafer characterization tools designed to measure wafer thickness, total thickness variation (TTV), bow, warp and flatness of semi-insulating and semiconducting materials. MTII’s Aviation Balancing Instruments group provides state-of-the-art
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Optical Fiber Array With Precise Hole Sizing
A method of making and an etchable wafer substrate for use in making optical fiber array plates includes forming a progressively increasing series of metrology holes when the plate holes are formed. The variation between designed plate hole diameter and actual plate hole diameter is determined
Engineering Web Search: Wafer Probe Top
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CBP Changes Classification of Wafer Probe Cards
CBP Publishes Revocation of Two Ruling Letters On the Classification of Wafer Probe Cards October 5, 2010
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High Performance Probe Systems :: Cascade Microtech, Inc.:
thermal station to probe 200mm or 300mm wafers, Cascade Microtech offers a complete line of high-performance solutions for on-wafer probing, circuit
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Cascade Microtech Announces Production Availability of DC...
16 Jul 03Cascade Microtech Announces Production Availability of DC Parametric Pyramid Probe Cards to Enable More Die per Wafer
- RTD-T30-X (Page 50)
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Qualmax supplies most reliable WLP probe card in the market
Total Solution for Semiconductor IC Test Socket, Spring Contact Probe, Wafer Probe Card and High Density Coaxial Connector
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wlihome
vertical probe card solutions for memory and logic · cantilever probe cards · complete custom probe card design · full complement of probers for
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APT of multilayer films
Atom Probe Tomography Characterization of Multilayer Films G.B. Thompson,* H.L. Fraser* and M. K. Miller** *Materials Science and Engineering
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EECS 141: Digital Integrated Circuits - Spring 1998
Basic Operation of Programmed-Probe Based Aberration Targets1 A generic optical projection printing system consisting of a coherently illuminated