Plasma generators are special generators that produce the needed RF power to ignite and maintain plasma in plasma chambers and similar devices. High-frequency RF fields, typically emitting around 13.56 MHz, are used to generate capacitively coupled plasma (CCP) or wave-heated plasma, which is then used in various integrated circuit (IC) manufacturing processes such as etching and plasma-enhanced chemical vapor deposition (PECVP). Important plasma generator specifications include power, accuracy, and frequency stability.
A typical plasma generator.
Image credit: MKS Instruments