Electronic and semiconductor gases are specialized for microelectronic manufacturing or semiconductor processing applications such as thin film deposition - including both chemical vapor deposition (CVD) and physical vapor deposition (PVD) - etching, RTP, packaging, or soldering. Electronic and semiconductor gases includes pure gases and gas mixtures configured for specific purposes, including crystal growth, wafer fabrication, oxidation, thermal diffusion, and ion implantation.
Electronic and semiconductor gases for semiconductor manufacturing include ammonia, argon, helium, hydrogen, oxygen, and a wide variety of other high-purity gases based on halocarbon compounds. Electronic and semiconductor gases may also be combined for specific use. For example, a halocarbon pure gas may be combined with oxygen to etch polysilicon or silicon dioxide, or can be combined with another halocarbon to clean wafers and chambers. Electronic and semiconductor gases include high-grade gases used to reduce impurities in sputtering depositions.
Electronic and semiconductor gases also include gas mixtures and mixtures of gases and liquids that are used for measurement and process control applications. Electronic gases may come in gaseous form such as nitrogen, helium, or the halocarbons. Others may come in a liquid state, such as hydrogen chloride, which is an electronic gas used for plasma and thermal etching, and nitrous oxide, which is a semiconductor gas used with silane for chemical vapor deposition. Microelectronic gas can be hazardous and requires special handling. Each electronic gas from a manufacturer comes with a federally mandated material safety data sheet (MSDS) which explains the safety and handling features of the gas. Some gases may be flammable, corrosive or toxic if breathed. Compressed electronic and semiconductor gases such as nitrogen or argon can displace oxygen and cause asphyxiation in closed areas.
