Equipment utilized to deposit thin films or modify the composition of a surface; e.g., through ion implantation or a nitriding or carburizing diffusion process.

What are you looking for in Thin Film Equipment?

MEMS processing equipment is used to create micro-electro-mechanical systems (MEMS) sensors and wafers.
Search by Specification  |  Learn more about MEMS Processing Equipment

Semiconductor cluster tools and equipment are used to process semiconductor wafers for the production of microelectronic components.
Search by Specification  |  Learn more about Semiconductor Cluster Tools

Semiconductor metrology instruments are designed for wafer and thin film in-line inspection after semiconductor processing. They include capacitance gages, C-V systems, electron beam probes, ellipsometers, interferometers, I-V system, magnetometers, optical systems, profilometers, reflectometers, resistance probes, RHEED systems, and X-ray diffractometers.  
Search by Specification  |  Learn more about Semiconductor Metrology Instruments

Thin Film Equipment (343 suppliers)

Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
Search by Specification  |  Learn more about Thin Film Equipment

Thin Film Monitors (56 suppliers)

Thin film monitors are used to analyze and/or control thin film deposition rate, composition and properties.
Search by Specification  |  Learn more about Thin Film Monitors

Thin Film Sources (81 suppliers)

Thin film sources consist of magnetrons, evaporation thermal units, ion beams and other sources that produce deposition materials (vapors or ions) in a thin film system.
Learn more about Thin Film Sources

e-newsletter sign up product alert sign up