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have continued to shrink as outlined in the National Technology Roadmap for Semiconductors , it has become increasingly important to identify and isolate wafer defects in order to meet yield targets...
Frank Poag and Douglas Paradis, ; and Mahesh Reddy and Jon Button, Data consistency and rapid response to yield-limiting defect excursions are among the benefits realized from the installation of...
Jerry X. Chen, Robert K. Henderson, and Franklin Kalk, DuPont Photomasks Reticle Technology Center Attenuated embedded phase shift masks (PSMs) based on molybdenum silicon (MoSi) are being...
Randy Williams and Robert Jacques, ; and Mustafa Akbulut and Wayne Chen, A collaborative study that used an advanced unpatterned wafer inspection system found that epitaxial defects and their...
Chipmakers will require detection, inspection, and review technologies with particle sensitivities between 0.18 and 0.10 µm at greater throughputs than are currently available, according to the...