The adjustable fluid flow control and end-of-cycle snuffback features of the Model 725DA-SS valve eliminate drips in spin coating applications. A stainless-steel fluid chamber, an inert polymer diaphragm, and sealing head isolate the actuator from wetted components to ensure trouble-free cycles. Compact and light, the valve is suitable for installation in automated assembly machines and robotic equipment. Deposit volume is accurate to ensure consistent film thickness on each wafer. Rapid, clean coating cutoff is designed to eliminate streaks. Dispense tips are available in different styles and sizes. Suitable for use with 300-mm wafers, the automated PW2830 x-ray fluorescence analyzer determines layer composition, contamination, stoichiometry, thickness, dopant levels, and surface uniformity for a wide range of process films. The automatic instrument processes up to 15 wafers per hour using a 4-kW Super-Sharp tube and specially designed high-performance channels. These features permit rapid measurement of critical light elements such as boron and nitrogen. The instrument checks process steps such as BPSG, metals, silicides, salicides, nitrides, and dielectrics. The ceramic x-ray tube has a stainless-steel outer plate for extended operating life. Oil-free pumps ensure a clean subpascal vacuum in the measuring chamber, minimizing the risk of carbon contamination on reference samples. Uptime is >98% and MTBF is >1000 hours with a transfer rate of >50,000 wafers without failure. After alignment, the wafer remains oriented constantly for spot measurements at all points on its surface. In addition to FOUP, loading options include cassette and manual operation. The system's 20 fixed measuring channels can be customer specified, and
Products & Services
Thin Film Equipment
Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
Semiconductor Cluster Tools
Semiconductor cluster tools and equipment are used to process semiconductor wafers for the production of microelectronic components.
Cleanrooms are contamination-free environments where high-tech manufacturing and assembly take place.
Semiconductor Metrology Instruments
Semiconductor metrology instruments are designed for wafer and thin film in-line inspection after semiconductor processing. They include capacitance gages, C-V systems, electron beam probes, ellipsometers, interferometers, I-V system, magnetometers, optical systems, profilometers, reflectometers, resistance probes, RHEED systems, and X-ray diffractometers.
Thin Film Coating Services
Thin film coating services apply very thin layers of specialized materials to part surfaces. They perform processes such chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, electrochemical deposition (ECD), plasma etching, rapid thermal processing (RTP), and titanium nitride coating.
SUSS MicroTec Precision Photomask offers high precision photomasks from 4" up to 32" on quartz or soda lime materials. We provide complete CAD services from Design Digitization and Data Conversion to...
Topics of Interest
An automated deep-UV spectrophotometer measures samples of thin-film coatings, photoresists, silicon wafers, deep-UV optics, dry fused silica, and calcium fluoride under vacuum or purged conditions.
The NovaLine A4005 is a 193-nm ultranarrow-bandwidth laser for optical lithography systems. The unit's line-narrowing optics and high repetition rate of 4 kHz yield an output power of 20 W at a...
The sealed-chamber design of the Portable Clean Room maintains a positive-pressure nitrogen environment for more than three days to protect wafers in transit from molecular contaminants, oxygen, and...
The JVX 5200 thin-film metrology unit measures film thickness, density, roughness, and elemental concentrations. Films may be single layer or multilayer; metal or dielectric; and single crystal,...
Matrix S200 metrology systems for CMP and etch provide application-specific sets of metrology techniques. The S200 CMP system has a 5 ´ 10-mm-spot, 633-nm HeNe laser ellipsometer for measuring...