Addressing the challenges posed by warp-speed chipmaking advances, the organizers of next month's SPIE microlithography symposium have scheduled several joint sessions covering an array of defect and yieldrelated topics. Overall, both the oral presentations and poster sessions reflect an industry seeking to clear some of the haze surrounding the shift to 157-nm and next-generation lithography (NGL) processes. The 27th annual event will feature special joint sessions on contamination, wafer inspection, defect reduction, and yield improvement during four major conferences. Among the issues covered in the special sessions are hydrocarbon impurities on the optical surfaces at 157 nm, direct-to-digital holography for wafer defect detection, the effect of a scanned electron beam on an advanced logic device, and SEM inspection of optically invisible defects. The broad-ranging microlithography symposium is set for March 38 at the Santa Clara Convention Center and the adjoining Westin Hotel (Santa Clara, CA). The four conference topics are emerging lithographic technologies; metrology, inspection, and process control; resist technology and processing; and optical microlithography. The symposium opens with a keynote address by Bob Helms, president and CEO of International Sematech. The title of Helms's speech is "Silicon Technology Roadmap: Bigger ChallengesNew R&D Business Models?" A high number of
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Helium Cadmium (HeCd) Lasers
Helium cadmium (HeCd) lasers are relatively economical, continuous-wave sources for violet (442 nm) and ultraviolet (325 nm) output. They are used for 3-D stereolithography applications, as well as for exposing holographs.
Nanomaterials have features or particle sizes in the range of 1 to 100 nm.
Web Inspection Systems
Web inspection systems are used for the detection and/or automatic identification of web or web coating patterns and defects or problems such as streaks and blurs.
Network appliances are inexpensive personal computers (PC) or computer boards that provide Internet access and promote network security. They lack many of the features of fully-equipped PCs, however.
Ion lasers function by stimulating the emission of radiation between two levels of an ionized gas. They provide moderate to high continuous-wave output of typically 1 mW to 10 W.
Topics of Interest
Defect detection presentations will play an even larger role in the metrology and inspection technical sessions at this year's Microlithography Conference than in previous years. The notable increase...
When SPIE Microlithography convenes each year, you can bet on two things: news stories from the lithography sector will increase dramatically around the show, and the meeting itself will provide great...
Alternative lithographic methods, the semiconductor industry's equivalent of baseball's "wait-til-next-year" teams, may finally have their day in the sun. Several novel techniques standing ready to...
SPIE Microlithography may be the most important focus event on the semiconductor industry calendar. Nearly 3300 professionals attended this year's gathering held at the Santa Clara Convention Center...
157 nm is on track, Canon says Canon's semiconductor equipment division expects to ship its first 157-nm lithography systems during the second half of 2003. The vendor has addressed major technical...