The KA250 wafer carrier is molded of PEEK and a polycarbonate to ensure low-particulate operation and dimensional stability. The carrier's wafer and equipment contacts are made of Stat-Pro 3000, a static-dissipative PEEK material, while a polycarbonate is used in the frame and end wall. The design also ensures reliable equipment interface and robotic wafer transfer. StableWafer pocket design technology controls the wafer plane even when the wafer is removed from its pocket up to 21/2 in. from the fully seated position. This feature eliminates wafer chatter and flutter. Carriers can be colored red, blue, or green to differentiate wafer lots. End walls may also be a different color from the carrier's frame in order to extend color coding options. Additional identifying markers such as RF tags or adhesive bar code labels are also available. Designed for sub-0.15-µm metrology, the VeraSEM accommodates both 200- and 300-mm wafers and can be upgraded to measure critical dimensions on sub-0.13-µm geometries. The system's process variation monitoring technology uses a column design and special algorithms to measure line edge roughness, line edge width variation, and open or closed contact holes. A high-speed stage, fast wafer handling, and accurate measurement algorithms ensure high throughput. The Gencobot 9 servo-controlled robot offers repeatable indexing and transfer of wafers and flat-panel displays in vacuum processes >=10—8 torr. The robot's global positioning system ensures accurate transfer of 300-mm wafers. An optional yaw-axis feature eliminates the need for radial placement of process stations or cassettes around the robot. A variety of arm options permits the robot to transport an array of wafers, FPDs, and photomasks up
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Products & Services
Photolithography Services
Photolithography services create photomasks and use them to etch or engrave patterns on semiconductor substrates.
Thin Film Equipment
Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
Cleanrooms
Cleanrooms are contamination-free environments where high-tech manufacturing and assembly take place.
Lithography Equipment
Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.

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MTI Instruments Inc. - Semiconductor Wafer Thickness Gage
Proforma 300/G - Manual, non-contact measurement system for wafer thickness, TTV and bow. Portable and easy to set-up, the Proforma 300/G measures most wafer materials including Silicon,... (read more)
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The ACS200Plus is a modular and automated cluster system designed to meet manufacturers' needs for clean, reliable, high throughput, and modular photolithography processing. SUSS MicroTec ACS200Plus... (read more)
SUSS MicroTec - ACS300 Gen2
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SUSS MicroTec - SB6/8e Semi-Automated Wafer Bonding System
Precision Wafer Bonding Solution The SB6/8e is a semi-automatic, computer controlled, stand-alone wafer bonder accommodating 150mm and 200mm wafers respectively. The SB6/8e system features a rigid... (read more)

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