Products & Services
Chemical mechanical planarization (CMP) slurries consist of surface active chemicals and microabrasive grains in a liquid dispersion.
Topics of Interest
MEMS contamination questions starting to yield some answers Firesafe plastics for fab environments scrutinized; Lucent, Emcore team to develop new thin films; CMP wastewater reclaim system debuts;...
The grand tradition of start-ups China growth poses problems; TEL, Ebara, Dainippon Screen form E-beam trio; Selete endorses Oasis data stream format AMD, Infineon, UMC to develop logic manufacturing...
Big changes needed to satisfy cleanroom, boardroom, exec says Show's explosive growth mirrors IC industry expansion on island MEMC chooses McCarthy for 300-mm line; Air Products, BOC split bill on new...
Wider 'Net-based tool diagnosis is becoming a remote possibility Applied enters yet another market segment with introduction of Swift implantation tool New head of silicon house foresees 5�19%...
The following list highlights the conferences, symposia, workshops, and similar activities taking place during the week of Semicon West 2000. The San Francisco events appear first, in chronological...