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Electron-Beam Steering (Feedback-Loop) for Scanning Lithography

From KineticSystems/GaGe

The customer uses a scanning-electron-beam lithography instrument. Their current digital pattern-generator is based on a commercial high-performance array processor, which uses dual RISC-processors. The system is capable of creating large-area patterns composed of multiple stitched fields. Conversion software has been developed which allows a CAD data-file to be fractured and
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