From SUSS MicroTec
In this paper, a revolutionary NIL technique, SCIL, and the corresponding tooling solution on SUSS mask aligners has been introduced. The imprints of 2D holes array over 6 inch area in sol-gel and AMONIL resist with soft PDMS stamp have been demonstrated. The structure depth and residual layer uniformity have been evaluated by measurements on the imprinted wafer. The capability of the UV enhanced SCIL process in AMONIL resist on different substrates has also been demonstrated. The unique consequently imprint principle and the composite stamp guarantee the conformal imprint and the compatibility for production atmosphere. This technique shows therefore great potential in high volume production of HB LED due to its excellent reliability.
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Topics of Interest
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